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Phosphorus Determination in Borophosphosilicate or Phosphosilicate Glass Films on a Si Wafer by Wavelength Dispersive X-ray Spectroscopy

Published online by Cambridge University Press:  06 March 2019

H. S. Levine  and
K. L. Higgins
H. S. Levine
Affiliation:
Sandia National Laboratories Albuquerque, NM 87185
K. L. Higgins
Affiliation:
Sandia National Laboratories Albuquerque, NM 87185
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Extract

Films of borophosphosilicate glass (BPSG) or phosphosilicate glass (PSG) are deposited on single crystal Si (100) wafers (typically 4 to 6 inches in diameter) by chemical vapor deposition processes during the fabrication of radiation-hardened microcircuits. These films act as insulator and as passivation layers. Since the P content of the glass layer is critical because of fluidity and corrosion problems, careful certification is required. The certification analysis has been accomplished here previously by empirical energy dispersive (ED) X-ray fluorescence (XRF) methods which use a set of expensive and fragile PSG wafer calibration standards. The results obtained were uncertain and the standards were sometimes broken.

Type
VI. Geological and Other Applications of X-Ray Spectrometry
Information
Advances in X-Ray Analysis , Volume 34: Thirty-Ninth Annual Conference on Applications of X-ray Analysis, July 30 - August 3, 1990 , 1990 , pp. 299 - 305
Copyright
Copyright © International Centre for Diffraction Data 1990

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References

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