Hostname: page-component-745bb68f8f-d8cs5 Total loading time: 0 Render date: 2025-01-15T06:30:14.587Z Has data issue: false hasContentIssue false
  • English
  • Français

Residual Stress in Thin Films of Rf-Sputtered Aluminum by X-ray Multtaxial Stress Measurement

Published online by Cambridge University Press:  06 March 2019

Shoukhi Ejiri ,
Zheng Lin ,
Tosihiko Sasaki  and
Yukio Hirose
Shoukhi Ejiri
Affiliation:
Graduate Student of Kanazawa University
Zheng Lin
Affiliation:
Graduate Student of Kanazawa University
Tosihiko Sasaki
Affiliation:
Department of Materials Science and Engineering, Kanazawa University Kakuma-machi, Kanazawa, 920-11 Japan
Yukio Hirose
Affiliation:
Department of Materials Science and Engineering, Kanazawa University Kakuma-machi, Kanazawa, 920-11 Japan
Get access

Extract

Residual stress in thin films of RF-sputtered aluminum coated on substrate of glass was measured by X-ray multiaxial stress measurement. The films were manufactured under the various conditions such as temperature of substrate ranged from 473K to 573K, and pressure of argon gas range from 0.0093Pato 13.3Pa respectively. These results brought comprehension that residual stress existed in tri-axial and that was influenced by temperature of substrate and pressure of argon gas. Residual stresses were unstable in range of less than 1.33Pa of pressure of argon gas.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 433 - 438
Copyright
Copyright © International Centre for Diffraction Data 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. “The method of X-ray Stress Measurement, Revised Edition”, The Society of Materials Science, Japan, Yoken-do, Japan(1981).Google Scholar
2. Dölle, H., J. Appt. Cryst., vol. 12, 489 (1979).Google Scholar
3. Hanabusa, T., J. Society of Materials Science, Japan, vol. 42, 96 (1993).Google Scholar
4. Sasaki, T., Kuramoto, M. and Yoshida, Y., “Proceedings of the 28th symposium on X-ray studies on mechanical behaviour of materials”, The Society of Materials Science, Japan, 87(1992).Google Scholar
5. Van Houtte, P. and De Buyser, L., Acta metall. matter., vol. 41, 323 (1993).Google Scholar