Hostname: page-component-cd9895bd7-gxg78 Total loading time: 0 Render date: 2024-12-27T12:54:13.182Z Has data issue: false hasContentIssue false
  • English
  • Français

X-Ray Emission From Thin Film Materials

Published online by Cambridge University Press:  06 March 2019

P. A. Stine ,
S. J. Hruska  and
G. L. Liedl
P. A. Stine
Affiliation:
Purdue University, West Lafayette, Indiana 47907
S. J. Hruska
Affiliation:
Purdue University, West Lafayette, Indiana 47907
G. L. Liedl
Affiliation:
Purdue University, West Lafayette, Indiana 47907
Get access

Abstract

A theoretical model and experimental measurements of the X-ray emission from thin films generated by an electron beam were analyzed and compared. Ionization correction factors for the thin films and for substrate effects were developed to calculate intensity ratios of film and film on substrate to pure bulk intensities.

The fraction of electrons transmitted through gold, silver, and copper with energy greater than the critical excitation energy was measured as a function of thickness and primary electron energy. The characteristic X-ray intensities from gold on bismuth, palladium, nickel and aluminum Substrates; copper on palladium, nickel and aluminum substrates; and silver on aluminum substrates were measured and intensity ratios to pure bulk intensities were compared to the model prediction. The prediction of the X-ray intensity ratios were approximated by a simple electron balance model for the ionization correction factors and the consideration of electron energy distributions did not alter the predictions significantly.

An empirical conversion parameter, following the bulk procedures of Ziebold and Ogilvie, was determined experimentally for alloy thin films of gold and silver on oxidized silicon substrates for films between 500 and 2000 Å. The prediction of the parameter from the intensity model is in fair agreement with the measured values. However, the empirical conversion parameter could prove to be useful for thin film analysis.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 17: Twenty-Second Annual Conference on Applications of X-ray Analysis, August 22-24, 1973 , 1973 , pp. 487 - 497
Copyright
Copyright © International Centre for Diffraction Data 1973

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Castaing, R., “Application of Electron Beams to a Method for Local Chemical and Crystallographical Analysis,” O.N.E.R.A. Publ. No. 55, (1951).Google Scholar
2. Philibert, J., “Electron Probe Microanalysis. Quantitative Analysis,” Fifth International Congress of X-Rav Optics and Microanalysis, (Springer-Verlag, New York, 1969), p. 114.Google Scholar
3. Theisen, R., Quantitative Electron Microprobe Analysis, (Springer-Verlag, Inc., New York, 1965), pp. 20–22.Google Scholar
4. Marshall, D. J., and Hall, T. A., “Electron-probe X-ray Microanalysis of Thin Films,” X-Ray Optics and Microanalysis, Fourth International Conference, (Hermann Press, Paris, 1966), PP. 374–81.Google Scholar
5. Djuric, B., and Cerovic, D., Fifth International Congress of X-Ray Optics and Microanalysis, (Springer-Verlag, New York, 1969), PP. 180–86.Google Scholar
6. Sweeney, W. E., Seebold, R. E., and Birks, L. L., “Electron Probe Measurements of Evaporated Metal Films,” J. Appl. Phys. 31, 1061 (1960).Google Scholar
7. Crockett, G. H., and Davis, C. D., “Coating Thickness Measurements by Electron Probe Microanalysis” Brit. J. Appl. Phys. 14, 813 (1963).Google Scholar
8. Hutchins, G. A., The Electron Probe (McKinley Heinrich, Wittrey, Eds.), John Wiley and Sons, New York, (1966), pp. 390–404.Google Scholar
9. Colby, J. W., “Quantitative Microprobe Analysis of Thin Insulating Films,” Advances in X-Ray Analysis, 11, (University of Denver, Plenum Press, New York, 1968), pp. 287–305.Google Scholar
10. Ziebold, T. O., and Ogilvie, R. E., “An Empirical Method for Electron Microanalysis,” Anal. Chem., 36, 322–327 (1964).Google Scholar
11. Green, M., and Cosslett, V. E., “The Efficiency of Production of Characteristic X-Radiation in Thick Targets of a Pure Element,” Proc. Phys. Soc. (London), 78, 1206 (1961).Google Scholar
12. Dyson, N. A., “The Continuous X-Ray Spectrum from Electron Opaque Targets,” Proc. Phys. Soc., 73, (1959), 924–936.Google Scholar
13. Springer, G., “The Correction for Continuous Fluorescence in Electronprobe Microanalysis,” 1967, Fortschritte der Mineralogie, Vol. 45, pp. 103–124.Google Scholar
14. Cosslett, V. E., and Thomas, R. N., “Multiple Scattering of 5-30 KeV Electrons in Evaporated Metal Films.” I. Total Transmission and Angular Distribution, Brit. J. Appl. Phys. 15, 883 (1964).Google Scholar
II. Range Energy Relations, Brit, J. appl. Phys., 15, 1283 (1964).Google Scholar
III. Backscattering and Absorption, Brit. J. Appl. Phys., 16, 779 (1965).Google Scholar
15. Bishop, H. E., “Calculations of Electron Penetration and X-Ray Production in a Solid Target,” Brit. J. Appl. Phys., 1, Series 2, 673 (1968).Google Scholar
16. Birks, L. S., Electron Probe Microanalysis, (Interscience, New York, 1963), PP. 201–237.Google Scholar