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CVD diamond deposition processes investigation: CARS diagnostics/modeling

Published online by Cambridge University Press:  31 January 2011

Stephen O. Hay
Affiliation:
United Technologies Research Center, East Hartford, Connecticut 06108
Ward C. Roman
Affiliation:
United Technologies Research Center, East Hartford, Connecticut 06108
Meredith B. Colket III
Affiliation:
United Technologies Research Center, East Hartford, Connecticut 06108
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Abstract

We have applied Coherent Anti-Stokes Raman Spectroscopy (CARS), using a narrowband, scanned colinear configuration, to measure temperatures, relative concentrations, and detect species in low pressure CVD of polycrystalline diamond. CARS measurements were obtained for methane, hydrogen, and acetylene in either or both a rf plasma reactor and a hot filament reactor. In the rf PACVD experiments a mixture of 1% CH4 in H2 was used at a total pressure of 5 torr. The rf power input to the plasma was 300 watts and the H2 and CH4 flow rates were 99 and 1 seem, respectively. As acetylene (C2H2) has been proposed as an intermediate in diamond growth, it was selected for the initial series of measurements. In the absence of rf power, a sensitivity of 5 mtorr was observed; in the plasma downstream of the rf coils, no observable signal attributable to C2H2 was evident. This places an upper limit to conversion of methane to acetylene at 20%, a figure representing the observed sensitivity to C2H2. In the hot filament reactor, the gas flow was 200 sccm of 1% CH4 in H2 at a total pressure of 150 torr. Under these conditions, C2H2 was detectable. Absolute concentrations were not calculated, but the observed spectra are within an order of magnitude of our sensitivity limit. This allows estimation of the C2H2 partial pressure near the substrate as 5–50 mtorr or from 0.66 to 6.6% conversion from methane. In view of this low conversion percentage, the absence of a signal in the rf experiments must be taken as inconclusive. CARS spectra of methane were also obtained in both reactors. In the rf reactor, under similar conditions to those described previously, the methane relative concentration decreased to 25% as the rf power was increased from zero to 400 watts. In the hot filament reactor, CH4 CARS signal profiles were obtained as a function of axial distance from the hot filament, and parametrically as a function of filament temperature. Comparison of these profiles, in which the observed signal decayed monotonically as the filament was approached and increased monotonically downstream of the filament, was made with theoretical calculations. This comparison showed that the fluctuations were attributable to temperature/pressure effects and not to chemistry. To determine if the observed depletion in the rf plasma was similarly attributable, the CARS signal of hydrogen was observed as a function of axial distance downstream of the rf coil centerline and parametrically as a function of rf power. In contrast to expected behavior in the thermal hot filament reactor, little rotational excitation was observed in the plasma. Rotational temperatures were assigned to hydrogen based upon comparison with theoretically derived spectra. At 450 watts of rf power, rotational temperatures of 340 K were observed 4 to 6 cm downstream of the coil, the region where the 25% decrease in CH4 was observed. Little or no density fluctuations accrue due to these temperatures, indicating that the observed depletion in methane signal is attributable to decomposition or chemical reaction in the plasma. In summary, CARS is applicable to reactant species (CH4) axial profiling in both reactors, but can be limited by sensitivity in the detection of intermediate or product species (C2H2). In addition, CARS thermometry can be utilized to profile the rotational temperatures of selected species.

Type
Diamond and Diamond-Like Materials
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1Celii, F., Pehrsson, P., Wang, H., and Butler, J., Appl. Phys. Lett. 52 (24), (June 1988).CrossRefGoogle Scholar
2Ohtake, N. and Yoshikawa, M., J. Electrochem. Soc. 137 (2), 717722 (1990).CrossRefGoogle Scholar
3Sawabe, A. and Inuzika, T., Appl. Phys. Lett. 46 (2), 146147 (1985).CrossRefGoogle Scholar
4Yarbrough, W. and Messier, R., Science 247, 688695 (1990).CrossRefGoogle Scholar
5Matsumoto, S., Proc. 7th Int. Symp. on Plasma Chemistry, Einhoven, edited by Dimmermans, C. J., 1, 7984 (1985).Google Scholar
6Hirose, Y. and Kindo, N., paper presented at the Japan Society of Applied Physics Symposium, Tokyo, Japan, March 1988.Google Scholar
7Singh, B., Arie, Y., Levine, A., and Mesker, O., Appl. Phys. Lett. 52, 451 (1988).CrossRefGoogle Scholar
8Fujimori, N., Ikegaya, A., Imai, T., Fukushima, K., and Ohta, N., Proc. 1st Int. Symp. on Diamond and Diamond-Like Films, edited by Dismukes, J. P., Purdes, A. J., Spear, K. E., Meyerson, B. S., Ravi, K.V., Moustakas, T. D., and Yoder, M. (The Electrochemical Society, Pennington, NJ, 1989), pp. 465474.Google Scholar
9Deutchman, A., Partyka, R., and Lewis, J., “Room Temperature Deposition of Diamond Films with the New DIOND Dual Deposition”, Proc. of SDIO/IST-ONR Diamond Technology Initiative Symposium paper no. T3, Crystal City, VA, July 1989.Google Scholar
10Lifshitz, Y., Kasi, S., and Rabalais, J., “In Situ Parametric Studies of Diamond Film Growth from Low Energy, Mass Selected Carbon Beams,” Proc. of SDIO/IST-ONR Diamond Technology Initiative Symposium paper no. TP7, Crystal City, VA, July 1989.Google Scholar
11Eckbreth, A. C. and Stufflebeam, J., in Process Diagnostics: Materials, Combustion, Fusion, edited by Hays, A. K., Eckbreth, A. C., and Campbell, G.A. (Mater. Res. Soc. Symp. Proc. 117, Pittsburgh, PA, 1988).Google Scholar
12Eckbreth, A. C., Laser Diagnostics for Combustion Temperature and Species (Abacus Press, Tunbridge Wells, Kent, U.K., 1987).Google Scholar
13Roman, W. C., Colket, M. B., Hay, S. O., and Eckbreth, A., “CARS Diagnostics and Analysis of Species in Diamond Deposition Process,” Presentation at the 1st Int. Symp. on Diamonds and Diamond-Like Films,” Electrochemical Society Meeting, CA, May 7–12, 1989.Google Scholar
14Roman, W.C. and Eckbreth, A.C., “CARS Detection of Gaseous Species for Diamond Deposition Processes,” 197th ACS National Meeting, Dallas, TX. Division of Fuel Chemistry Preprints 34 (2), 508516 (1989).Google Scholar
15Roman, W. C., Stuff, J. Jebeam, and Eckbreth, A., in Process Diagnostics: Materials, Combustion, Fusion, edited by Hays, A. K., Eckbreth, A. C., and Campbell, G. A. (Mater. Res. Soc. Symp. Proc. 117, Pittsburgh, PA, 1988).Google Scholar
16Spear, K. and Frenklach, M., “Mechanistic Hypothesis on Diamond Growth from the Vapor”. Presented at 3rd SDIO/IST-ONR Diamond Technology Initiative Symposium, Arlington, VA, July 1988.Google Scholar
17Lucht, R. P. and Farrow, R. L., “Saturation Effects in Coherent Anti-Stokes Raman Scattering of Hydrogen: An Experimental and Theoretical Investigation”, Sandia Report SAND89–8479, Sandia National Laboratories, Livermore, CA, 1989.CrossRefGoogle Scholar
18Sherman, A., Chemical Vapor Deposition for Microelectronics (Noyes Publications, NJ, 1987).Google Scholar
19Matsumoto, S.Y., Kamo, M., Tenaka, J., and Setaka, N., “Chemical Vapor Deposition of Diamond from Methane-Hydrogen Gas”, Proc. 7th Int. Conf. on Vac. Metallurgy, Tokyo, Japan, pp. 386391, 1982.Google Scholar
20Solin, S. and Ramdas, A., Phys. Rev. B 1, 16871698 (1970).CrossRefGoogle Scholar
21Reynolds, W. C., “STANJAN, Interactive Computer Programs for Chemical Equilibrium Analysis”, Stanford University, January 1981.Google Scholar
22Kee, R. J., Miller, J. A., and Jefferson, T. H., “CHEMKIN: A General-Purpose, Problem-Independent, Transportable, Fortran Chemical Kinetics Code Package”, Sandia National Laboratories, SAND80–8003, March 1980.Google Scholar
23Warnatz, J., in Combustion Chemistry, edited by Gardiner, W. C. (Springer-Verlag, New York), pp. 197360.Google Scholar
24Harris, S. J., Weiner, A. M., and Perry, T. A., Appl. Phys. Lett. 53 (17), 16051607 (1988).CrossRefGoogle Scholar
25Celii, F. G. and Butler, J. E., Appl. Phys. Lett. 54 (11), 10311033 (1989).CrossRefGoogle Scholar
26Friedlander, S. K., Smoke, Dust and Haze (John Wiley and Sons, New York, 1977).Google Scholar
27Stein, S.E., J. Phys. Chem. 82, 566 (1978).CrossRefGoogle Scholar
28Stein, S.E. and Fahr, A., J. Phys. Chem. 89, 37143725 (1985).CrossRefGoogle Scholar
29Frenklach, M., Clary, D.W., Yuan, T., Gardiner, W.C., and Stein, S.E., Combustion Science and Technology 50, 79115 (1986).CrossRefGoogle Scholar