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Effect of substrate pregrowth treatments on characteristics of low-temperature diamondlike carbon films prepared by very-high-frequency chemical vapor deposition

Published online by Cambridge University Press:  31 January 2011

Zafar Waqar ,
Alexander Nikolaivech Titkov ,
Alexander Nikolaivech Andronov ,
Andrey Kosarev  and
Igor Makarenko
Zafar Waqar
Affiliation:
A.F. Ioffe Physical-Technical Institute, Russian Academy of Sciences, 194021 Saint Petersburg, Russia
Alexander Nikolaivech Titkov
Affiliation:
A.F. Ioffe Physical-Technical Institute, Russian Academy of Sciences, 194021 Saint Petersburg, Russia
Alexander Nikolaivech Andronov
Affiliation:
Physical Electronics Department, Saint Petersburg State Technical University, Russian Federation Ministry of Education, 194251 Saint Petersburg, Russia
Andrey Kosarev
Affiliation:
A.F. Ioffe Physical-Technical Institute, Russian Academy of Sciences, 194021 Saint Petersburg, Russia
Igor Makarenko
Affiliation:
A.F. Ioffe Physical-Technical Institute, Russian Academy of Sciences, 194021 Saint Petersburg, Russia
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Abstract

Diamondlike carbon (DLC) films were grown on Si and ceramic substrates by very-high-frequency chemical vapor deposition at temperature of approximately 250 °C. Thin metal coatings from Ti, Ni, Pt, and Cu were deposited on the substrates before DLC film deposition. The impact of the pregrowth treatments of the substrates on surface morphology and emission properties of the grown DLC films was studied. The films deposited on ceramic substrates pretreated by Ti, Ni, and Pt coatings, with grainlike structures, demonstrated good emission currents and low threshold voltages among the deposited DLC films.

Type
Articles
Information
Journal of Materials Research , Volume 17 , Issue 2 , February 2002 , pp. 451 - 455
Copyright
Copyright © Materials Research Society 2002

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