Hostname: page-component-cd9895bd7-gvvz8 Total loading time: 0 Render date: 2024-12-28T14:22:53.306Z Has data issue: false hasContentIssue false

Electron microscopic interfacial analysis of diamond film grown on silicon substrate

Published online by Cambridge University Press:  31 January 2011

N. Jiang*
Affiliation:
Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan, and Beijing Laboratory of Electron Microscopy, Chinese Academy of Science, Beijing 100080, People's Republic of China
A. Hatta
Affiliation:
Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan
T. Ito
Affiliation:
Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan
Z. Zhang
Affiliation:
Beijing Laboratory of Electron Microscopy, Chinese Academy of Science, Beijing 10008, People's Republic of China
T. Sasaki
Affiliation:
Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan
A. Hiraki
Affiliation:
Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan
*
(a) Hiraki Laboratory, Department of Electrical Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565, Japan.
Get access

Abstract

We have investigated the near-interface characterization of diamond films grown on Si(100) substrates by means of a hot-filament chemical-vapor-deposition (HFCVD) method using high-resolution-electron microscopy (HREM). Atomic scale study of the diamond/Si interface reveals that on the top of the amorphous intermediate layer, there exists a precursor phase which seems to be a diamond-like structure, which provides a suitable site for subsequent diamond nucleation. High density crystal defects directly originate from the precursor phase. HREM images also reveal that during the deposition Si recrystallizes in some damaged areas left by pretreatment, such as scratching grooves. In the recrystallization process twins and microtwins can be formed, and amorphous solid is left in the Si crystals.

Type
Articles
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Kobayashi, K., Karasawa, S., and Watanabe, T., J. Cryst. Growth 99, 1211 (1990).CrossRefGoogle Scholar
2.Williams, B. E. and Glass, J. T., J. Mater. Res. 4, 373 (1989).CrossRefGoogle Scholar
3.Sung, C. P. and Shih, H. C., J. Mater. Res. 7, 105 (1992).CrossRefGoogle Scholar
4.Jiang, N., Sun, B. W., Zhang, Z., and Lin, Z., J. Mater. Res. 9, 2702 (1994).Google Scholar
5.George, M. A., Burger, A., Collins, W. E., Davidson, J.L., Barnes, A. V., and Tolk, N. H., J. Appl. Phys. 76, 4099 (1994).CrossRefGoogle Scholar
6.Singh, J. and Vellaikal, M., J. Appl. Phys. 73, 2883 (1993).Google Scholar
7.Stoner, B. R., Ma, G-H.M., Wottetr, S. D., and Glass, J. T., Phys. Rev. B 45, 11067 (1992).CrossRefGoogle Scholar
8.Kawarda, H., Ma, J.S., Suzuki, J. T., Ito, T., Mori, H., Fujita, H., and Hiraki, A., Jpn. J. Appl. Phys. 26, 1963 (1987).Google Scholar
9.Saeed, A., Gaskell, P.A., and Jefferson, D. A., Philos. Mag. B 66, 174 (1992).Google Scholar
10.Angus, J. C., Ssunkara, M., Sahaida, S. R., and Glass, J.T., J. Mater. Res. 7, 3001 (1992).CrossRefGoogle Scholar
11.Jiang, N., Zhang, Z., Sun, B. W., and Shi, D., Appl. Phys. Lett. 63, 329 (1993).Google Scholar
12.Ma, G-H. M., Lee, Y. H., and Glass, J. T., J. Mater. Res. 5, 2373 (1990).CrossRefGoogle Scholar
13.Minowa, K. and Sumino, K., Phys. Rev. Lett. 69, 320 (1992).CrossRefGoogle Scholar