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Prediction of chemical vapor deposition rates on monofilaments and its implications for fiber properties

Published online by Cambridge University Press:  31 January 2011

S.A. Gökoĝlu ,
M. Kuczmarski  and
L.C. Veitch
S.A. Gökoĝlu
Affiliation:
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135
M. Kuczmarski
Affiliation:
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135
L.C. Veitch
Affiliation:
National Aeronautics and Space Administration, Lewis Research Center, Cleveland, Ohio 44135
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Abstract

Deposition rates are predicted in a cylindrical upflow reactor designed for chemical vapor deposition (CVD) on monofilaments. Deposition of silicon from silane in a hydrogen carrier gas is chosen as a relevant example. The effects of gas and surface chemistry are studied in a two-dimensional axisymmetric flow field for this chemically well-studied system. Model predictions are compared to experimental CVD rate measurements. The differences in some physical and chemical phenomena between such small diameter (∼150 μm) fiber substrates and other typical CVD substrates are highlighted. The influence of the Soret mass transport mechanism is determined to be extraordinarily significant. The difficulties associated with the accurate measurement and control of the fiber temperature are discussed. Model prediction sensitivities are investigated with respect to fiber temperatures, fiber radii, Soret transport, and chemical kinetic parameters. The implications of the predicted instantaneous rates are discussed relative to the desired fiber properties for both batch and continuous processes.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 11 , November 1992 , pp. 3023 - 3031
Copyright
Copyright © Materials Research Society 1992

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