Hostname: page-component-78c5997874-v9fdk Total loading time: 0 Render date: 2024-11-11T02:51:45.605Z Has data issue: false hasContentIssue false

Effect of scan rates and imposed potentials on the formationand growth of oxide film on Ti6Al4V alloy surface in 3% NaCl

Published online by Cambridge University Press:  23 September 2011

E. Nouicer
Affiliation:
Laboratory of Phases Transformation, Department of Physics, Constantine University, 25000, Algeria. e-mail: n_elamine@yahoo.fr
F.Z. Benlahreche
Affiliation:
Industrial Chemistry Department, Constantine University, 25000, Algeria
L. Yahia
Affiliation:
Laboratory of Phases Transformation, Department of Physics, Constantine University, 25000, Algeria. e-mail: n_elamine@yahoo.fr
M. Eutamene
Affiliation:
Industrial Chemistry Department, Constantine University, 25000, Algeria
H. Chadli
Affiliation:
Metallurgy and Materials engineering Department, Annaba University, 23000, Algeria
Get access

Abstract

In the present study, the formation and growth of an oxide film on a titanium alloyTi6Al4V surface immersed in 3% NaCl solution using anodisation at various imposedpotentials was investigated by two electrochemical techniques, cyclic polarisation andimpedance measurements. In the cyclic polarisation studies at different scan rates, theobtained curves show a large range of passivation, due to the formation of a protectiveoxide film, generally TiO2. In addition, the negative hysteresis that appearedduring the cyclic polarisation with the shift of the corrosion potential in the more nobledirection (approximately +260 mV) may be explained by a reduction of the corrosionproducts. It was found that the lower the scan rates the lower the passivation current,and the scan rates did not have a significant effect on the potential or current ofcorrosion. The impedance measurements (Nyquist and Bode plots) at various imposedpotentials show that Ti6Al4V has a capacitive behaviour in the passive field, due to theformation and growth of the oxide film.

Type
Research Article
Copyright
© EDP Sciences, 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Cai, Z., Shafer, T., Watanabe, I., Nunn, M.E., Okabe, T., Biomaterials 24 (2003) 213-218
Gurappa, I., Materials Characterization 49 (2002) 73-79
Huang, H.H., Lee, T.H., Electrochemical impedance spectroscopy study Of Ti–6Al–4V alloy in artificial saliva with fluoride and/or bovine albumin, Dental Materials 21 (2005) 749-755 Google ScholarPubMed
Wei Hsu, R.W., Yang, C.C., Huang, C.A., Chen, Y.S., Mater. Sci. Eng. A 380 (2004) 100-109
Marino, C.E.B., Mascaro, L.H., J. Electroanal. Chem. 568 (2004) 115-120
Gurrappa, I., Reddy, D.V., J. Alloys Comp. 390 (2005) 270-274
Huang, Y.Z., Blackwood, D.J., Electrochim. Acta 51 (2005) 1099-1107
Khaled, M.M., Yilbas, B.S., Al-Qaradawi, I.Y., Coleman, P.G., Abdulmalik, D., Seddigi, Z.S., Abulkibash, A., Abu-Sharkh, B.F., Emad, M.M., Surf. Coat. Technolo. 201 (2006) 932-937
Khelfaoui, Y., Kerkar, M., Bali, A., Dalard, F., Surf. Coat. Technolo. 200 (2006) 4523-4529
Habib, K., Dessalination 166 (2004) 171-190
Li, M., Luo, S., Wu, P., Shen, J., Electrochim. Acta 50 (2005) 3401-3406
Monticelli, C., Frignani, A., Bellosi, A., Brunoro, G., Trabanelli, G., Corros. Sci. 43 (2001) 979-992
Almeida, E., Costa, M.R., Cristofaro, N.D., Mora, N., Catala, R., Puente, J.M., Bastidas, J.M., Corros. Eng. Sci. Technol. 40 (2005) 2
Xie, Y., Liu, X., Chu, P.K., Zheng, X., Ding, C., Surf. Coat. Technol. 200 (2005) 1950-1953
Lin, C.M., Yen, S.K., Mater. Sci. Eng. C 26 (2006) 54-64
Ng, B.S., Annergren, I., Soutar, A.M., Khor, K.A., Jarfors, A.E.W., Biomaterials 26 (2005) 1087-1095
Jaeggi, C., Kern, P., Michler, J., Zehnder, T., Siegenthaler, H., Surf. Coat. Technolo. 200 (2005) 1913-1919
Azumi, K., Yasui, N., Seo, M., Corros. Sci. 42 (2000) 885-896
Gueneau de Mussy, J.P., Macpherson, J.V., Delplancke, J.L., Electrochim. Acta 48 (2003) 1131-1141
Zhang, W., Wang, C., Liu, W., Wear 260 (2006) 379-386
Oliveira, N.T.C., Ferreira, E.A., Duarte, L.T., Biaggio, S.R., Filho, R.C. R., Bocchi, N., Electrochim. Acta 51 (2006) 2068-2075
Hodgson, A.W.E., Mueller, Y., Forster, D., Virtanen, S., Electrochim. Acta 47 (2002) 1913-1923
Karthega, M., Raman, V., Rajendran, N., Acta Biomaterialia 3 (2007) 1019-1023
Shukla, A.K., Balasubramaniam, R., Bhargava, S., Intermetallics 13 (2005) 631-637
Blackwood, D.J., Chooi, S.K.M., Corros. Sci. 44 (2002) 395-405
Pelaez-Abellan, E., Rocha-Sousa, L., Muller, W.-D., Guastaldi, A.C., Corros. Sci. 49 (2007) 1645-1655
Souza, M.E.P., Ballester, M., Freire, C.M.A., Surf. Coat. Technol. 201 (2007) 7775-7780
Zoppi, R.A, Trasferetti, B.C., Davanzo, C.U., J. Electroanal. Chem. 544 (2003) 47-57
Santana-Lopez, A., Mirza-Rosca, J., Eur. Cells Mater. 5 (2003) 12-14
Tamilselvi, S., Raman, V., Rajendran, N., Electrochim. Acta 52 (2006) 839-846
Raman, V., Nagarajan, S., Rajendran, N., Electrochem. Commun. 8 (2006) 1309-1314