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Mapping of Process-Induced Dopant Redistributions by Electron Holography

Published online by Cambridge University Press:  01 August 2004

Wolf-Dieter Rau  and
Alexander Orchowski
Wolf-Dieter Rau
Affiliation:
LEO Electron Microscopy GmbH, Carl Zeiss SMT AG, Carl Zeiss Str. 56, D-73447 Oberkochen, Germany
Alexander Orchowski
Affiliation:
LEO Electron Microscopy GmbH, Carl Zeiss SMT AG, Carl Zeiss Str. 56, D-73447 Oberkochen, Germany
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Abstract

We present and review dopant mapping examples in semiconductor device structures by electron holography and outline their potential applications for experimental investigation of two-dimensional (2D) dopant diffusion on the nanometer scale. We address the technical challenges of the method when applied to transistor structures with respect to quantification of the results in terms of the 2D p–n junction potential and critically review experimental boundary conditions, accuracy, and potential pitfalls. By obtaining maps of the inner electrostatic potential before and after anneals typically used in device processing, we demonstrate how the “vertical” and “lateral” redistribution of boron during device fabrication can directly be revealed. Such data can be compared with the results of process simulation to extract the fundamental parameters for dopant diffusion in complex device structures.

Keywords

electron holographytwo-dimensional dopant profilinginner electrostatic potentialdopant diffusion models
Type
Materials Applications
Information
Microscopy and Microanalysis , Volume 10 , Issue 4 , August 2004 , pp. 462 - 469
Copyright
© 2004 Microscopy Society of America

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References

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