Hostname: page-component-cd9895bd7-hc48f Total loading time: 0 Render date: 2024-12-27T15:03:25.660Z Has data issue: false hasContentIssue false

Screw Dislocations in GaN Grown by Different Methods

Published online by Cambridge University Press:  22 January 2004

Z. Liliental-Weber
Affiliation:
Lawrence Berkeley National Laboratory, m/s 62R0203-8255, Berkeley, CA 94720, USA
D. Zakharov
Affiliation:
Lawrence Berkeley National Laboratory, m/s 62R0203-8255, Berkeley, CA 94720, USA
J. Jasinski
Affiliation:
Lawrence Berkeley National Laboratory, m/s 62R0203-8255, Berkeley, CA 94720, USA
M.A. O'Keefe
Affiliation:
Lawrence Berkeley National Laboratory, m/s 62R0203-8255, Berkeley, CA 94720, USA
H. Morkoc
Affiliation:
Virginia Commonwealth University, Richmond, VA 23284, USA
Get access

Abstract

A study of screw dislocations in hydride-vapor-phase-epitaxy (HVPE) template and molecular-beam-epitaxy (MBE) overlayers was performed using transmission electron microscopy (TEM) in plan view and in cross section. It was observed that screw dislocations in the HVPE layers were decorated by small voids arranged along the screw axis. However, no voids were observed along screw dislocations in MBE overlayers. This was true both for MBE samples grown under Ga-lean and Ga-rich conditions. Dislocation core structures have been studied in these samples in the plan-view configuration. These experiments were supported by image simulation using the most recent models. A direct reconstruction of the phase and amplitude of the scattered electron wave from a focal series of high-resolution images was applied. It was shown that the core structures of screw dislocations in the studied materials were filled. The filed dislocation cores in an MBE samples were stoichiometric. However, in HVPE materials, single atomic columns show substantial differences in intensities and might indicate the possibility of higher Ga concentration in the core than in the matrix. A much lower intensity of the atomic column at the tip of the void was observed. This might suggest presence of lighter elements, such as oxygen, responsible for their formation.

Type
Research Article
Copyright
© 2004 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Arslan, I. & Browning, N.D. (2002). Intrinsic electronic structure of threading dislocations in GaN. Phys Rev B 65, 075310-1075310-10.Google Scholar
Cherns, D. (2000). The structure and optoelectronic properties of dislocations in GaN. J Phys Condensed Matter 12, 1020510212.Google Scholar
Elsner, J., Jones, R., Haugk, M., Gutierrez, R., Frauenheim, Th., Heggie, M., Öberg, S., & Briddon, P.R. (1998). Effect of oxygen on the growth of (1010) GaN surfaces: The formation of nanopipes. Appl Phys Lett 73, 35303532.Google Scholar
Elsner, J., Jones, R., Sitch, P.K., Porezag, V.D., Elstner, M., Frauenheim, Th., Heggie, M.I., Öberg, S., & Briddon, P.R. (1997). Theory of threading edge and screw dislocations in GaN. Phys Rev Lett 79, 36723675.Google Scholar
Heying, B., Wu, X.H., Keller, S., Li, Y., Kapolnek, D., Keller, B.P., Denbaars, S.P., & Speck, J. (1996). Role of threading dislocation structure on the X-ray diffraction peak widths in epitaxial GaN films. Appl Phys Lett 68, 643645.Google Scholar
Hsu, J.W.P., Manfra, M.J., Chu, S.N.G., Chen, C.H., Pfeiffer, L.N., & Molnar, R.J. (2001). Effect of growth stoichiometry on electrical activity of screw dislocations in GaN films grown by molecular-beam epitaxy. Appl Phys Lett 78, 39803982.Google Scholar
Keller, S., Keller, B.P., Wu, Y-F., Heying, B., Kapolnek, D., Speck, J.S., Mishra, U.K., & Denbaars, S.P. (1996). Influence of sapphire nitridation on properties of gallium nitride grown by metalorganic chemical vapor deposition. Appl Phys Lett 68, 15251527.Google Scholar
Lester, S.D., Ponce, F.A., Craford, M.G., & Steigewald, D.A. (1995). High dislocation densities in high efficiency GaN-based light-emitting diodes. Appl Phys Lett 66, 12491251.Google Scholar
Liliental-Weber, Z., Chen, Y., Ruvimov, S., & Washburn, J. (1997a). Formation mechanism of nanotubes in GaN. Phys Rev Lett 79, 28352842.Google Scholar
Liliental-Weber, Z., Washburn, J., Pakula, K., & Baranowski, J. (1997b). Convergent beam electron diffraction and transmission electron microscopy study of interfacial defects in GaN homoepitaxial films. Microsc Microanaly 3, 436442.Google Scholar
Nakamura, S., Senoh, M., Nagahama, S., Iwasa, N., Yamada, T., Matsushita, T., Kiyoku, H., Sugimoto, Y., Kozaki, T., Umemoto, H., Sano, M., & Chocho, K. (1998). InGaN/GaN/AlGaN-based laser diodes with modulation-doped strained-layer superlattices grown on an epitaxially laterally overgrown GaN substrate. Appl Phys Lett 72, 211213.Google Scholar
Northrup, J.E. (2001). Screw dislocations in GaN: The Ga-filled core model. Appl Phys Lett 78, 22882290.CrossRefGoogle Scholar
Northrup, J.E. (2002). Theory of intrinsic and H-passivated screw dislocations in GaN. Phys Rev B 66, 045204-1045204-5.Google Scholar
O'Keefe, M.A. & Kilaas, R. (1988). Advances in high-resolution image simulation. Scan Microsc (suppl. 2) 225244.Google Scholar
Ponce, F.A., Cherns, D., Young, W.T., & Steeds, J.W. (1996). Characterization of dislocations in GaN by transmission electron diffraction and microscopy techniques. Appl Phys Lett 69, 770772.Google Scholar
Qian, W., Rohrer, G.S., Skowronski, M., Doverspike, K., Rowland, L.B., & Gaskill, D.K. (1995). Open-core screw dislocations in GaN epilayers observed by scanning force microscopy and high-resolution transmission electron microscopy. Appl Phys Lett 67, 22842286.Google Scholar
Thust, A., Coene, W.M.J., Op De Beeck, M., & Van Dyck, D. (1996). Focal-series reconstruction in HRTEM: Simulation studies on non-periodic objects. Ultramicroscopy 64, 211230.Google Scholar
Wright, A.F. & Furthmuller, J. (1998). Theoretical investigation of edge dislocations in AlN. Appl Phys Lett 72, 34673469.Google Scholar