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Advanced Hybrid Positioning System of SEM and AFM for 2D Material Surface Metrology

Published online by Cambridge University Press:  09 June 2022

Taeryong Kim ,
Donghwan Kim ,
TaeWan Kim ,
Hyunwoo Kim  and
ChaeHo Shin Open the ORCID record for ChaeHo Shin [Opens in a new window]
Taeryong Kim
Affiliation:
Department of Materials Science & Engineering, Seoul National University, Seoul 08826, South Korea
Donghwan Kim
Affiliation:
Interdisciplinary Materials Measurement Institute, Korea Research Institute of Standards and Science, Daejeon 34113, South Korea
TaeWan Kim
Affiliation:
Department of Electrical Engineering and Smart Grid Research Center, Jeonbuk National University, Jeonju, South Korea
Hyunwoo Kim*
Affiliation:
Laboratory for Advanced Molecular Probing (LAMP), Korea Research Institute of Chemical Technology, Daejeon 34114, South Korea
ChaeHo Shin*
Affiliation:
Interdisciplinary Materials Measurement Institute, Korea Research Institute of Standards and Science, Daejeon 34113, South Korea
*
*Corresponding authors: Hyunwoo Kim, E-mail: hwkim@krict.re.kr; ChaeHo Shin, E-mail: chaeho.shin@kriss.re.kr
*Corresponding authors: Hyunwoo Kim, E-mail: hwkim@krict.re.kr; ChaeHo Shin, E-mail: chaeho.shin@kriss.re.kr
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Abstract

As the measurement scale shrinks, the reliability of nanoscale measurement is even more crucial for a variety of applications, including semiconductor electronics, optical metamaterials, and sensors. Specifically, it is difficult to measure the nanoscale morphology at the exact location though it is required for novel applications based on hybrid nanostructures combined with 2D materials. Here, we introduce an advanced hybrid positioning system to measure the region of interest with enhanced speed and high precision. A 5-axis positioning stage (XYZ, R, gripper) makes it possible to align the sample within a 10-μm field of view (FOV) in both the scanning electron microscope (SEM) and the atomic force microscope (AFM). The reproducibility of the sample position was investigated by comparing marker patterns and denting points between the SEM and AFM, revealing an accuracy of 6.5 ± 2.1 μm for the x-axis and 4.5 ± 1.7 μm for the y-axis after 12 repetitions. By applying a different measurement process according to the characteristics of 2D materials, various information such as height, length, or roughness about MoTe2 rods and MoS2 film was obtained in the same measurement area. As a consequence, overlaid two images can be obtained for detailed information about 2D materials.

Keywords

5-axis positioning systematomic force microscopyMoS2MoTe2overlay imagescanning electron microscopy
Type
Software and Instrumentation
Information
Microscopy and Microanalysis , Volume 28 , Issue 5 , October 2022 , pp. 1604 - 1610
Copyright
Copyright © The Author(s), 2022. Published by Cambridge University Press on behalf of the Microscopy Society of America

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Footnotes

†

These authors contributed equally to this work.

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