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Analysis of the Intensity Curves Obtained by the Unidirectional Laser Oblique Illumination Technique at Different Magnifications

Published online by Cambridge University Press:  30 July 2002

Eduardo Alfredo Favret
Affiliation:
Comisión Nacional de Energía Atómica (CNEA), U.A. Materiales CAC and Instituto Sábato, Universidad Nacional Gral. San Martín—CNEA, Lincoln 831, Castelar (1712), Argentina
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Abstract

The study of the gaussian parameter ω—the approximate width of a peak at half height—of the intensity curves obtained by means of the Unidirectional Laser Oblique Illumination technique employed in the optical microscopy of materials permits introduction of the concept of variation of a surface pattern at different magnifications. This concept establishes how the surface pattern or topography varies among different areas when different magnifications are used. Diffraction gratings and metallic surfaces which have been subjected to different metallographic procedures are analyzed, using objectives of 8×, 16×, and 32×.

Type
INSTRUMENTATION AND THEORY
Copyright
2002 Microscopy Society of America

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