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Characterization of Sputtered Shape Memory Alloy Ni-Ti Films by Cross-sectional TEM and SEM

Published online by Cambridge University Press:  03 October 2008

R.M.S. Martins ,
A. Mücklich ,
N. Schell ,
R.J.C. Silva ,
K.K. Mahesh  and
F.M. Braz Fernandes
R.M.S. Martins
Affiliation:
FZD, P.O. Box 510119, 01314 Dresden, Germany CENIMAT/I3N, Campus da FCT/UNL, 2829-516 Monte de Caparica, Portugal
A. Mücklich
Affiliation:
FZD, P.O. Box 510119, 01314 Dresden, Germany
N. Schell
Affiliation:
GKSS, Max-Planck-Str. 1, 21502 Geesthacht, Germany
R.J.C. Silva
Affiliation:
CENIMAT/I3N, Campus da FCT/UNL, 2829-516 Monte de Caparica, Portugal
K.K. Mahesh
Affiliation:
CENIMAT/I3N, Campus da FCT/UNL, 2829-516 Monte de Caparica, Portugal
F.M. Braz Fernandes
Affiliation:
CENIMAT/I3N, Campus da FCT/UNL, 2829-516 Monte de Caparica, Portugal

Abstract

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Ni-Ti Shape Memory Alloys (SMAs) have been attracting attention as smart materials because they can work as sensors and actuators at the same time. Miniaturization of mechanical devices is evolving toward sub-micron dimensions raising important questions in the properties of Ni-Ti films. In thin films it is essential to investigate the microstructure to understand the origin of the thickness limit. The design of functionally graded films has also been considered but for their successful development it is important to characterize the variations in crystalline structure.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 14 , Supplement S3 , September 2008 , pp. 85 - 86
Copyright
Copyright © Microscopy Society of America 2008