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Chemical Shift of Electron Energy-Loss Near-Edge Structure on the Nitrogen K-Edge and Titanium L3-Edge at TiN/Ti Interface

Published online by Cambridge University Press:  16 March 2009

Shohei Terada*
Affiliation:
Materials Research Laboratory, Hitachi Ltd., 7-1-1 Omika, Hitachi, Ibaraki 319-1292, Japan
Kyoichiro Asayama
Affiliation:
Renesas Technology Corp., 5-20-1 Josuihon, Kodaira, Tokyo 187-8588, Japan
Masahiko Tsujimoto
Affiliation:
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
Hiroki Kurata
Affiliation:
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
Seiji Isoda
Affiliation:
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
*
Corresponding author. E-mail: shohei.terada.cq@hitachi.com
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Abstract

We investigated the chemical shift of the electron energy-loss near-edge structure (ELNES) for the nitrogen K-edge and titanium L3-edge measured from the interface region between a titanium nitride layer and a titanium layer. Both the titanium nitride and titanium layers were prepared by a sputtering method. Elemental analysis for nitride and titanium in the vicinity of the interface region was performed using a standard technique in electron energy-loss spectroscopy. It was demonstrated that both the ELNES of nitrogen K-edge and titanium L3-edge presented the chemical shift, more or less, depending on the composition of TiNx. The experimental findings were interpreted using a first-principles band structure calculation. The chemical shifts of nitrogen K-edge and titanium L3-edge can be used as fingerprinting for readily distinguishing the composition of TiNx.

Type
Materials Applications
Copyright
Copyright © Microscopy Society of America 2009

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References

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