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Enhancing the Resolution and Sensitivity of STEM by Aberration Correction

Published online by Cambridge University Press:  01 November 2002

N. D. Browning ,
K. Sun ,
R. F. Klie ,
J. Liu ,
M. M. Disko ,
N. Dellby  and
O. L.Krivanek
N. D. Browning
Affiliation:
1University of Illinois, Department of Physics, 845 W. Taylor St, Chicago, IL 60607, USA
K. Sun
Affiliation:
1University of Illinois, Department of Physics, 845 W. Taylor St, Chicago, IL 60607, USA
R. F. Klie
Affiliation:
1University of Illinois, Department of Physics, 845 W. Taylor St, Chicago, IL 60607, USA
J. Liu
Affiliation:
2Monsanto Company, 800 N. Lindbergh Avenue, U1E, St Louis, MO 63167, USA
M. M. Disko
Affiliation:
3ExxonMobil Res. & Eng. Corp, Corporate Strategic Research, Annandale, NJ 08801. USA
N. Dellby
Affiliation:
4Nion Company, 1102 8th Street, Kirkland, WA 98033, USA
O. L.Krivanek
Affiliation:
4Nion Company, 1102 8th Street, Kirkland, WA 98033, USA

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 8 , Issue S02 , August 2002 , pp. 18 - 19
Copyright
Copyright © Microscopy Society of America 2002