Examining the Sensitivity of Electron Holography for Two-Dimensional p-n Junction Mapping

Z Wang; D Li

doi:10.1017/S1431927606061873

Examining the Sensitivity of Electron Holography for Two-Dimensional p-n Junction Mapping

Published online by Cambridge University Press: 31 July 2006

Z Wang and

D Li

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Z Wang: Affiliation:
Micron Technology,Inc.
D Li: Affiliation:
Micron Technology,Inc.

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Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006

Type: Abstract
Information: Microscopy and Microanalysis , Volume 12 , Issue S02 , August 2006 , pp. 1716 - 1717

DOI: https://doi.org/10.1017/S1431927606061873 [Opens in a new window]

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Examining the Sensitivity of Electron Holography for Two-Dimensional p-n Junction Mapping

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