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Measurand-Optimized, Content-Aware Scanning Electron Microscopy

Published online by Cambridge University Press:  05 August 2019

András E. Vladár  and
Bradley N. Damazo
András E. Vladár
Affiliation:
Microsystems and Nanotechnology Division National Institute of Standards and Technology (NIST), MD, USA.
Bradley N. Damazo
Affiliation:
Microsystems and Nanotechnology Division National Institute of Standards and Technology (NIST), MD, USA.

Abstract

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Type
Data Acquisition Schemes, Machine Learning Algorithms, and Open Source Software Development for Electron Microscopy
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 244 - 245
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Vladar, et al. , 10 nm 3-dimensional CD-SEM metrology (2014) https://doi.org/10.1117/12.2045977Google Scholar
[2]Scipioni, et al. , Helium Ion Microscope Advanced Materials and Processes (2008).Google Scholar
[3]Vladar, et al. , Elimination of Electron-Beam-Induced Carbonaceous Contamination in SEMs and the new RGM 10100 NIST Contamination Testing Artifact (2018) https://www2.avs.org/symposium2018/Papers/Paper_VT-TuP9.htmlGoogle Scholar
[4]Contributions of the National Institute of Standards and Technology are not subject to copyright. Mention of commercial products or services in this paper does not imply approval or endorsement by NIST, nor does it imply that such products or services are necessarily the best available for the purpose.Google Scholar