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A Method for Directly Correlating Site-Specific Cross-Sectional and Plan-View Transmission Electron Microscopy of Individual Nanostructures

Published online by Cambridge University Press:  12 November 2012

Daniel K. Schreiber ,
Praneet Adusumilli ,
Eric R. Hemesath ,
David N. Seidman ,
Amanda K. Petford-Long  and
Lincoln J. Lauhon
Daniel K. Schreiber*
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208-3108, USA Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA
Praneet Adusumilli
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208-3108, USA
Eric R. Hemesath
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208-3108, USA
David N. Seidman
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208-3108, USA Northwestern University Center for Atom-Probe Tomography, 2220 Campus Drive, Evanston, IL 60208-3108, USA
Amanda K. Petford-Long
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208-3108, USA Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439, USA
Lincoln J. Lauhon
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208-3108, USA
*
*Corresponding author. E-mail: daniel.schreiber@pnnl.gov
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Abstract

A sample preparation method is described for enabling direct correlation of site-specific plan-view and cross-sectional transmission electron microscopy (TEM) analysis of individual nanostructures by employing a dual-beam focused-ion beam (FIB) microscope. This technique is demonstrated using Si nanowires dispersed on a TEM sample support (lacey carbon or Si-nitride). Individual nanowires are first imaged in the plan-view orientation to identify a region of interest; in this case, impurity atoms distributed at crystalline defects that require further investigation in the cross-sectional orientation. Subsequently, the region of interest is capped with a series of ex situ and in situ deposited layers to protect the nanowire and facilitate site-specific lift-out and cross-sectioning using a dual-beam FIB microscope. The lift-out specimen is thinned to electron transparency with site-specific positioning to within ∼200 nm of a target position along the length of the nanowire. Using the described technique, it is possible to produce correlated plan-view and cross-sectional view lattice-resolved TEM images that enable a quasi-3D analysis of crystalline defect structures in a specific nanowire. While the current study is focused on nanowires, the procedure described herein is general for any electron-transparent sample and is broadly applicable for many nanostructures, such as nanowires, nanoparticles, patterned thin films, and devices.

Keywords

transmission electron microscopyfocused ion beamsample preparationnanowires
Type
Materials Applications
Information
Microscopy and Microanalysis , Volume 18 , Issue 6 , December 2012 , pp. 1410 - 1418
Copyright
Copyright © Microscopy Society of America 2012

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Footnotes

†

Current address: Pacific Northwest National Laboratory, Richland, WA 99352, USA

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