Hostname: page-component-cd9895bd7-jn8rn Total loading time: 0 Render date: 2025-01-01T02:40:36.546Z Has data issue: false hasContentIssue false
  • English
  • Français

Morphological and Electrical Characterization of Ti and ZrSputter-Deposited Thin Films

Published online by Cambridge University Press:  30 December 2005

E. F. Chinaglia  and
I. C. Oppenheim
E. F. Chinaglia
Affiliation:
Universidade de Sao Paulo, Brazil Shimadzu do Brasil Comercio Ltda., Brazil
I. C. Oppenheim
Affiliation:
Universidade de Sao Paulo, Brazil
Get access

Extract

Thin film morphology and electrical resistivity play an important role in modern technologies. In particular, subcomponents fabricated by Ti play an increasing role in microelectronic device technology as well as in the biomedical area [1-2]. Here the influence of substrate temperature (during deposition) and film thickness on the surface morphology and electrical resistivity of polycrystalline Ti and Zr thin films have been investigated.

Type
Other
Information
Microscopy and Microanalysis , Volume 11 , Issue S03 , December 2005 , pp. 126 - 129
Copyright
© 2005 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)