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Mossbauer and XPS analysis of Fe-SiO2 and Fe-SiO2/SiO2 granular films

Published online by Cambridge University Press:  01 August 2002

S. Honda ,
T. Shimizu ,
I. Sakamoto ,
T. Une  and
K. Kawabata
S. Honda
Affiliation:
ECS. Fac. of Science and Engineering, Shimane University, Matsue, Shimane 690-8504, Japan
T. Shimizu
Affiliation:
ECS. Fac. of Science and Engineering, Shimane University, Matsue, Shimane 690-8504, Japan
I. Sakamoto
Affiliation:
AIST Tsukuba, 1-1-1 Umezono, Tsukuba 305-8568, Japan
T. Une
Affiliation:
EPS Engineering, Hiroshima Inst. Tech., 2-1-1 Miyake, Saeki, Hiroshima 731-5193, Japan
K. Kawabata
Affiliation:
EPS Engineering, Hiroshima Inst. Tech., 2-1-1 Miyake, Saeki, Hiroshima 731-5193, Japan

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 8 , Issue S02 , August 2002 , pp. 1366 - 1367
Copyright
Copyright © Microscopy Society of America 2002