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Selected Area Electron Beam Induced Deposition of Pt and W for EBSD Backgrounds

Published online by Cambridge University Press:  18 February 2019

William A. Osborn Open the ORCID record for William A. Osborn [Opens in a new window] ,
Mark J. McLean  and
Brian Bush
William A. Osborn*
Affiliation:
Materials Measurement Science Division, National Institute of Standards and Technology, 100 Bureau Drive, MS 8520, Gaithersburg, MD, USA
Mark J. McLean
Affiliation:
Materials Measurement Science Division, National Institute of Standards and Technology, 100 Bureau Drive, MS 8520, Gaithersburg, MD, USA
Brian Bush
Affiliation:
Materials Measurement Science Division, National Institute of Standards and Technology, 100 Bureau Drive, MS 8520, Gaithersburg, MD, USA
*
*Author for correspondence: William A. Osborn, E-mail: william.osborn@nist.gov
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Abstract

Applying high-resolution electron backscatter diffraction (HR-EBSD) to materials without regions that are amenable to the acquisition of backgrounds for static flat fielding (background subtraction) can cause analysis problems. To address this difficulty, the efficacy of electron beam induced deposition (EBID) of material as a source for an amorphous background signal is assessed and found to be practical. Using EBID material for EBSD backgrounds allows single crystal and large-grained samples to be analyzed using HR-EBSD for strain and small angle rotation measurement.

Keywords

backgroundband contrastEBSDEBIDHR-EBSD
Type
Materials Science Applications
Information
Microscopy and Microanalysis , Volume 25 , Issue 1 , February 2019 , pp. 77 - 79
Creative Commons
This work is classified, for copyright purposes, as a work of the U.S. Government and is not subject to copyright protection within the United States.
Copyright
Copyright © Microscopy Society of America 2019

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