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The Emergence of Aberration Correctors for Electron Lenses

Published online by Cambridge University Press:  14 March 2018

John Silcox*
Affiliation:
Cornell University

Extract

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In 1936, Otto Scherzer published his famous theoretical paper on the correction of aberrations in round magnetic electron lenses. For fundamental reasons, the aberration coefficients are positive and to introduce negative corrections, the electron optical elements have to produce either charges or poles on the optic axis, or contain a mirror or be a multipole system. In 1997, three papers appeared with actual demonstrations of the correction of aberrations in imaging lenses, probe forming lenses and electron mirrors. It took almost two thirds of a century for this seemingly straightforward development to occur and for the promise of wavelength limited electron imaging to emerge as a practical proposition.

Type
Research Article
Copyright
Copyright © Microscopy Society of America 2002

References

[1] Scherzer, O., Z. Physik 101, 593603 (1936).CrossRefGoogle Scholar
[2] Haider, M., Uhiemann, S., Schwan, E., Rose, H., Kabius, B., Urban, K.. Nature, 392, 768769 (1998).Google Scholar
[3] Krivanek, O.L., Dellby, N., Spence, A.J.H., Camps, R.A. and Brown, L.M., EMAG 197 l.o.P. Conference series (ed. Rodenburg, J.M.) 153, 3540 (1997).Google Scholar
[4] Rempfer, G.F., D.M. Desloge, , Skoczylas, W.P., and Griffith, O.H., Microscopy and Microanalysis 3, 1427 (1997).Google Scholar
[5] Gabor, D., Proc. Roy. Soc. (London), 197 455487 (1949)Google Scholar
[6] Jiye, X. and Crewe, A.V., Optik 70 3742 (1985)Google Scholar
[7] Rose, H., Optik 85 1924 (1990).Google Scholar
[8] Zach, J. and Haider, M., Optik 98 112118 (1995).Google Scholar
[9] My interest in these topics over the years has been sustained by grants largely directed at the use of electron microscopy in materials supported by the Department of Energy, the National Science Foundation, the Department of Defense and the Semiconductor Research Corporation.Google Scholar