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Writing Nano-Scale Patterns on Insulators Using Variable Pressure Electron-Beam Lithography

Published online by Cambridge University Press:  14 March 2018

Floyd Miller  and
David Frey
Floyd Miller*
Affiliation:
Lehigh University Bethlehem, PA
David Frey*
Affiliation:
Carl Zeiss SMT Inc.
*
fcml@Lehigh.edu
frey@smt.zeiss.com

Extract

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Electron-beam lithography offers very high resolution patterns without the need for masks. Systems based on electron microscopes offer entry into electron-beam lithography at reasonable cost. Such systems are becoming popular in research environments due to their versatility and reasonable cost.

While these systems work well they do have problems writing on insulating substrates. The insulating substrate causes charge to build up from the incident electron-beam. As the charge builds up on the surface of the insulator, the incident beam is distorted and moved in x and y. The result is a lack of positioning accuracy on the patterns as well as pattern distortion.

Type
Research Article
Information
Microscopy Today , Volume 13 , Issue 6 , November 2005 , pp. 42 - 43
Copyright
Copyright © Microscopy Society of America 2005

References

1.Ed., Rai-Choudhury, P., Handbook of Microlithography. Micromachining. and Micro fabrication. Volume 1, Microlithography. pg 2.7.1 Google Scholar