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Synthesis and Characterization of Copper-Iron Nitride ThinFilms

Published online by Cambridge University Press:  14 December 2015

Hrishikesh Kamat*
Affiliation:
Alfred University, Alfred, NY 14802, U.S.A.
Xingwu Wang
Affiliation:
Alfred University, Alfred, NY 14802, U.S.A.
James Parry
Affiliation:
Department of Physics, University of Buffalo, Buffalo, NY 14260, U.S.A.
Yueling Qin
Affiliation:
Department of Physics, University of Buffalo, Buffalo, NY 14260, U.S.A.
Hao Zeng
Affiliation:
Department of Physics, University of Buffalo, Buffalo, NY 14260, U.S.A.
*
*(Email: hk12@alfred.edu)
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Abstract

Iron nitride thin films have potential applications in the biomedicine andenergy. The magnetic properties of these films can be tuned by incorporatingcopper nitride. In this study, iron copper nitride thin films have beenfabricated by magnetron sputtering technique either by co-sputtering ironnitride and copper nitride or by layer stacking of the materials. The structure,morphology and magnetic properties of the films have been studied by scanningelectron microscopy, x-ray diffraction, x-ray reflectivity and vibrating samplemagnetometry.

Type
Articles
Copyright
Copyright © Materials Research Society 2015 

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References

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