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CVD Processing

Published online by Cambridge University Press:  29 November 2013

Toshio Hirai
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Extract

Various methods are used in functionally gradient materials technology to control the composition and structure of a composite.

The chemical vapor deposition (CVD) method yields a deposit with source gases by applying variou s forms of energy (heat, light, plasma, etc.) to the gases after they are introduced into a CVD reactor. Hydride, bromide, and chloride are generally used for source materials. By continually changing the mixture ratio of source gases or by controlling the CVD conditions such as deposition temperatures, gas pressure, and gas-flow rate, CVD permits relatively easy syntheses of various FGMs (to a maximum thickness on the order of a centimeter).

Type
Functionally Gradient Materials
Information
MRS Bulletin , Volume 20 , Issue 1 , January 1995 , pp. 45 - 47
Copyright
Copyright © Materials Research Society 1995

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