Volatile Metal Alkylamides Serve as Precursors for Vapor Deposition of High-Dielectric-Constant Gate Insulator Materials

Mathew M. Maye

doi:10.1557/mrs2001.185

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Volatile Metal Alkylamides Serve as Precursors for Vapor Deposition of High-Dielectric-Constant Gate Insulator Materials

Published online by Cambridge University Press: 31 January 2011

Mathew M. Maye

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Type: Research/Researchers
Information: MRS Bulletin , Volume 26 , Issue 9: Challenges in Plutonium and Actinide Materials Science , September 2001 , pp. 660 - 661

DOI: https://doi.org/10.1557/mrs2001.185 [Opens in a new window]
Copyright: Copyright © Materials Research Society 2001

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Volatile Metal Alkylamides Serve as Precursors for Vapor Deposition of High-Dielectric-Constant Gate Insulator Materials

Volume 26, Issue 9
Mathew M. Maye
DOI: https://doi.org/10.1557/mrs2001.185

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Volatile Metal Alkylamides Serve as Precursors for Vapor Deposition of High-Dielectric-Constant Gate Insulator Materials

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