Hostname: page-component-745bb68f8f-s22k5 Total loading time: 0 Render date: 2025-01-15T06:59:15.852Z Has data issue: false hasContentIssue false
  • English
  • Français

Ablation of UV-Transparent Materials with Femtosecond UV Excimer Laser Pulses

Published online by Cambridge University Press:  25 February 2011

S. Küper  and
M. Stuke
S. Küper
Affiliation:
Max-Planck-Institut f. biophys. Chemie Dept. Laserphysik, P.O. 2841, D-3400 Göttingen, F.R. Germany
M. Stuke
Affiliation:
Max-Planck-Institut f. biophys. Chemie Dept. Laserphysik, P.O. 2841, D-3400 Göttingen, F.R. Germany
Get access

Abstract

Experiments on the ablation of undoped polytetrafluoroethylene (teflon), monocrystalline sodium chloride (NaCl) and polymethyl-methacrylate (PMMA) with 300 fs uv excimer laser pulses at 248 nm are reported. In contrast to standard 16 ns excimer laser pulses, these ultrashort pulses ablate essentially uv-transparent materials, heretofore not accessible to clean ablation, with good edge quality and no signs of thermal damage, with removal rates are on the order of one micrometer per pulse.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 129: Symposium B – Laser and Particle-Beam Modification of Chemical Processes on Surfaces , 1988 , 375
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Kawamura, Y., Toyoda, K., Namba, S.: Appl. Phys. Lett. 40, 374 (1982); J. Appl. Phys. 53, 6489 (1982)Google Scholar
[2] Srinivasan, R., Mayne-Banton, V.: Appl. Phys. Lett. 41, 576 (1982)CrossRefGoogle Scholar
[3] Rothschild, M., Ehrlich, D. J.: J. Vac. Sci. Technol. B 5, 389 (1987)Google Scholar
[4] Stuke, M., Zhang, Y., in Proceedings of the Symposium on Laser Processes for Microelectronic Applications, ed. by Ritsko, J. J., Ehrlich, D. J., Kashiwagi, M., (The Electrochemical Society, Pennington, NJ, 1988), p. 70 Google Scholar
[5] Szatmári, S., Schäifer, F.P., Müller-Horsche, E., Mückenheim, W.: Opt. Comm. 63, 305 (1987)CrossRefGoogle Scholar
[6] Glownia, J., Misewich, J., Sorokin, P.P., J. Opt. Soc. B 4, 1061 (1987)Google Scholar
[7] Küper, S., Stuke, M.: Appl. Phys. B 44, 199 (1987)Google Scholar
[8] Srinivasan, R., Sutcliffe, E., Braren, B.: Appl. Phys. Lett. 51, 1285 (1987)Google Scholar
[9] Sutcliffe, E., Srinivasan, R.: J. Appl. Phys. 60, 3315 (1986)Google Scholar
[10] Küper, S., Stuke, M.: Unpublished resultsGoogle Scholar
[11] Mita, I. in: Aspects of Degradation and Stabilization of Polymers, ed. by Jellinek, H.H.G., (Elsevier, Amsterdam, Oxford, New York 1978) p. 254 Google Scholar
[12] Taylor, A. J., Gibson, R. B., Roberts, J. P., in Technical Digest, Conference on Lasers and Electro-Optics (Optical Society of America, Washington, DC, 1988), paper WD 1; and A. J. Taylor, R. B. Gibson, J. P. Roberts: Opt. Lett. (1988), submittedGoogle Scholar
[13] Ready, J.F. in: Effects of High-Power Laser Radiation, (Academic Press, New York, London, 1971), p. 277 Google Scholar