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Composition and Chemical Structure of Nitrided Silica Gel

Published online by Cambridge University Press:  15 February 2011

R. K. Brow  and
C. G. Pantano
R. K. Brow
Affiliation:
Department of Materials Science and EngineeringThe Pennyslvania State University, University Park, PA 16802
C. G. Pantano
Affiliation:
Department of Materials Science and EngineeringThe Pennyslvania State University, University Park, PA 16802
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Abstract

Sol/gel derived silica thin films were thermally treated in NH3 for four hours at temperatures up to 1300C. The films were analyzed by ellipsometry, X-ray photoelectron spectroscopy (XPS) and infrared spectroscopy (IR). Over 30 mol% nitrogen was incorporated in the film treated at 1300C. Using IR and XPS analyses, -NHx groups were found to be present after low temperature treatments, while nitrogen was incorporated in an oxynitride structure after the higher temperature treatments.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 32: Symposium B – Better Ceramics Through Chemistry I , 1984 , 361
Copyright
Copyright © Materials Research Society 1984

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References

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