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Published online by Cambridge University Press: 01 February 2011
A new type of alkoxide precursor was developed to avoid the formation of the oxo-carbonate phase as an intermediate phase during crystallization. The precursors were synthesized from Ba metal, Sr metal and aminoethanol. The new precursors were found to be quite stable and soluble in a number of organic solvents. Films were prepared by depositing the precursor solution on Pt coated Silicon wafers and crystallized between 550 and 700°C. The films were found to crystallize only above 600°C. After crystallization Pt top electrodes were deposited by sputtering and lift off processing. FT-IR studies were performed on the films to check for any oxo-carbonate phase. Microstructural studies involving XRD, SEM and AFM were performed on the films. The films were found to have a dielectric constant of around 400 with a tunability of around 37%. The frequency and temperature dependence of the dielectric constant were also studied. In addition leakage studies were performed on the films at various temperatures.