Hostname: page-component-745bb68f8f-f46jp Total loading time: 0 Render date: 2025-01-15T06:45:35.527Z Has data issue: false hasContentIssue false
  • English
  • Français

Monte Carlo Simulations of Film Profile Evolution During Nonplanar CVD Processes

Published online by Cambridge University Press:  25 February 2011

Daniel G. Coronell  and
Klavs F. Jensen
Daniel G. Coronell
Affiliation:
Massachusetts Institute of Technology, Department of Chemical Engineering, Cambridge, MA 02139
Klavs F. Jensen
Affiliation:
Massachusetts Institute of Technology, Department of Chemical Engineering, Cambridge, MA 02139
Get access

Abstract

A Monte Carlo simulation approach has been developed to model transport and film profile evolution for rarefied gas flows during nonplanar CVD over trenches and contact holes. A systematic study of the effect of various parameters on the film conformality including intermolecular collisions, reactant sticking coefficient and feature geometry is reported.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 280: Symposium B – Evolution of Surface and Thin Film Microstructure , 1992 , 169
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Raupp, G.B. and Cale, T.S., Chem. Materials, 1, 207 (1989).CrossRefGoogle Scholar
2. Cooke, M.J. and Harris, G., J. Vac. Sci. Tech. A, 7, 3217 (1989).CrossRefGoogle Scholar
3. Tait, R.N., Smy, T., Brett, M.J., Thin Solid Films, 187, 375 (1990).CrossRefGoogle Scholar
4. Bird, G.A., Molecular Gas Dynamics, (Oxford, Cambridge, 1976) pp. 118–132.Google Scholar
5. Weeks, J.D. and Gilmer, G.H., in Advances in Chemical Physics, Vol. XL, edited by Prigogine, I. and Rice, S.A. (Wiley, New York, 1978), pp. 159–164.Google Scholar