Hostname: page-component-cd9895bd7-dk4vv Total loading time: 0 Render date: 2024-12-28T19:08:29.149Z Has data issue: false hasContentIssue false
  • English
  • Français

Rapid Growth of Radish Sprouts Using Low Pressure O2 Radio Frequency Plasma Irradiation

Published online by Cambridge University Press:  21 May 2012

Satoshi Kitazaki ,
Kazunori Koga ,
Masaharu Shiratani  and
Nobuya Hayashi
Satoshi Kitazaki
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka, 819-0395, Japan
Kazunori Koga
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka, 819-0395, Japan
Masaharu Shiratani
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka, 819-0395, Japan
Nobuya Hayashi
Affiliation:
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, 6-1 Kasuga-koen, Kasuga-shi, Fukuoka 816-8580, Japan
Get access

Abstract

We compared growth enhancement of radish induced by O2, air, and Ar plasma irradiation. The average length of radish sprouts cultivated for 4 days after O2 plasma irradiation is 70% longer than that of sprouts without irradiation. The O2 plasma irradiation is more effective in enhancing growth than air and Ar radio frequency plasma irradiation. Cell morphology and cell size of sprouts with O2 plasma irradiation is nearly the same as those without irradiation. These results suggest that plasma induced acceleration of cell proliferation brings about the rapid growth.

Keywords

biomedicalchemical reactionradiation effects
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1469: Symposium WW – Plasma Processing and Diagnostics for Life Sciences. , 2012 , mrss12-1469-ww02-08
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. National wide federation, Population & Agriculture , http://www.nwf.org/ Google Scholar
2. Kitazaki, S., Yamashita, D., Matsuzaki, H., Uchida, G., Koga, K., and Shiratani, M., Proc. IEEE TENCON. p.1960 (2010).Google Scholar
3. Akiyoshi, Y., Nakahigashi, A., Hayashi, N., Kitazaki, S., Iwao, T., Koga, K., and Shiratani, M., Proc. IEEE TENCON, p.1957 (2010).Google Scholar
4. Hayashi, N., Nakahigashi, A., Goto, M., Kitazaki, S., Koga, K., and Shiratani, M., Jpn. J. Appl. Phys. 50, 08JF04 (2011).10.7567/JJAP.50.08JF04Google Scholar
5. Kitazaki, S., Koga, K., Shiratani, M., and Hayashi, N., Jpn. J. Appl. Phys. 51, 01AE01 (2012).10.7567/JJAP.51.01AE01Google Scholar
6. Hayashi, N., Guan, W., Tsutsui, S., Tomari, T., and Hanada, Y., Jpn. J. Appl. Phys. 45, 8358 (2006).10.1143/JJAP.45.8358Google Scholar
7. Hayashi, N. and Yagyu, Y., Trans. Mater. Res. Soc. Jpn. 33, 791 (2008).Google Scholar
8. Kitazaki, S. and Hayashi, N.: IEEE Trans. Plasma Sci. 36 (2008) 1304.10.1109/TPS.2008.922451Google Scholar
9. Helmke, D. Hoffmeister, N. Mertens, S. Emmert, , Schuette, J., and Vioel, W.: New J. Phys. 11, 115025 (2009).10.1088/1367-2630/11/11/115025Google Scholar
10. Pomp, R., Jamitzky, F., Shimizu, T., Steffes, B., Bunk, W., Schmidt, H. U., Georgi, M., Ramrath, K., Stolz, W., Stark, R. W., Urayama, T., Fujii, S., and Morfill, G. E.: New J. Phys. 11, 115020 (2009).Google Scholar
11. Lee, J., Shon, C. H., Kim, Y. S., Kim, S., Kim, G. C., and Kong, M. G., New J. Phys. 11, 115026 (2009).10.1088/1367-2630/11/11/115026Google Scholar
12. Bayliss, D. L., Walsh, J. L., Shama, G., Iza, F., and Kong, M. G., New J. Phys. 11, 115024 (2009).10.1088/1367-2630/11/11/115024Google Scholar
13. Dubinov, A. E., Lazarenko, E. R., and Selemir, V. D., IEEE Trans. Plasma Sci. 28, 180 (2000).10.1109/27.842898Google Scholar
14. Kalghatgi, S. U., Fridman, A, Friedman, G, and Clyne, A.M, Proc. IEEE Eng. Med. Biol. Soc. 6030 (2009).Google Scholar
15. Zivkovic, S. P. N., Giba, Z., Grubisic, D., and Petrovic, Z. L. J., Seed Sci. Technol. 32, 693 (2004).10.15258/sst.2004.32.3.05Google Scholar
16. Sera, B., Spatenka, P., Sery, M., Vrchotova, N., and Hruskova, I., IEEE Trans. Plasma Sci. 38, 2963 (2010).10.1109/TPS.2010.2060728Google Scholar
17. Sera, B., Stranak, V., Sery, M., Tichy, M., and Spatenka, P., Plasma Sci. Technol. 10, 506 (2008).10.1088/1009-0630/10/4/22Google Scholar
18. Dobrynin, D., Fridman, G., Friedman, G., and Fridman, A., New J. Phys. 11 115020 (2009).10.1088/1367-2630/11/11/115020Google Scholar
19. Ebrahim, M. K. H., Acta Agron. Hungarica 52, 113 (2004).10.1556/AAgr.52.2004.2.1Google Scholar
20. Volin, J. C., Denes, F. S., Young, R. A., and Park, S. M. T., Crop Sci. 40 1706. (2000)10.2135/cropsci2000.4061706xGoogle Scholar
21. Takaki, K. and Ihara, S.: Denki Gakkai Ronbunshi A 129, 439 (2009) [in Japanese].Google Scholar
22. Tamaki, M., Ueda, T., and Isobe, S., Environ. Control Biol. 43, 223 (2005).10.2525/ecb.43.223Google Scholar
23. Kim, H. J., Chen, F., Wang, X., and Choi, J. H., J. Agric Food Chem. 54, 7263 (2006).10.1021/jf060568cGoogle Scholar