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Deposition energy dependence in cluster-assembled thin film densities

Published online by Cambridge University Press:  26 February 2011

Kristoffer Meinander ,
Tina Clauss  and
Kai Nordlund
Kristoffer Meinander
Affiliation:
kristoffer.meinander@helsinki.fi, University of Helsinki, Accelerator Laboratory, P.O.Box 43 (Pietari Kalmin katu 2), University of Helsinki, N/A, FI-00014, Finland, +358-9-191 50078, +358-9-191 50042
Tina Clauss
Affiliation:
tina.clauss@helsinki.fi, University of Helsinki, Accelerator Laboratory
Kai Nordlund
Affiliation:
kai.nordlund@helsinki.fi, University of Helsinki, Accelerator Laboratory, Finland
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Abstract

Mechanical properties of thin films grown by nanocluster deposition are highly dependent on the energy at which the clusters are deposited. Using molecular dynamics computer simulations we have quantitatively studied variations in the properties of copper thin films grown by deposition of Cu nanoclusters, at energies ranging from 5 meV to 10 eV per cluster atom, on a Cu (100) substrate.

Keywords

nanoscalesimulationCu
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 908: Symposium OO – Growth, Modification, and Analysis by Ion Beams at the Nanoscale , 2005 , 0908-OO14-20
Copyright
Copyright © Materials Research Society 2006

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