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Deposition of Pb(Zr, Ti)O3-Films on High-Grade Steel Hastelloy and Modification by Ion Implantation

Published online by Cambridge University Press:  10 February 2011

R. Klarmann ,
W. Biegel ,
B. Wörz ,
J. Hemberger  and
B. Stritzker
R. Klarmann
Affiliation:
Universität Augsburg, Institut für Physik, D-86135 Augsburg, Germany
W. Biegel
Affiliation:
Universität Augsburg, Institut für Physik, D-86135 Augsburg, Germany
B. Wörz
Affiliation:
Universität Augsburg, Institut für Physik, D-86135 Augsburg, Germany
J. Hemberger
Affiliation:
Universität Augsburg, Institut für Physik, D-86135 Augsburg, Germany
B. Stritzker
Affiliation:
Universität Augsburg, Institut für Physik, D-86135 Augsburg, Germany
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Abstract

Pulsed Laser Deposition (PLD) was used to deposit Pb(Zr,Ti)O3 thin films on high-grade steel Hastelloy. This material is suitable as substrate and electrode material as well. The deposited films were characterized with respect to their structural (XRD, RBS), topological (AFM) and their ferroelectric properties (P(E) hysteresis, retain and fatigue) which were found to be excellent. The ferroelectric properties in general, are sensitive to structural modifications and chemical doping and could therefore be influenced by ion implantation. Several species of ions (Ca+, O+) show different influence on the ferroelectric behavior and on the structural defects of the films. A subsequent annealing process can partially restore these modifications. The implanted Ca+ films were characterized by dielectric spectroscopy dependend on frequency and temperature to get information about ferroelectric domains.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 541: Symposium O – Ferroelectric Thin Films VII , 1998 , 179
Copyright
Copyright © Materials Research Society 1999

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References

REFERENCES

1. Xu, Y., Ferroelectric Materials and Their Applications, (Elsevier Science Publishers, Amsterdam, 1991)Google Scholar
2. Auciello, O. and Ramesh, R. (eds.), Electroceramic Thin Films Part II. Device Applications, MRS Bulletin 21 (1996) 29 Google Scholar
3. Sayer, M., Barrow, D.A., Notteboom, R., Grisworld, E.M., Wu, Z., Science and Technology of Electroceramic Thin Films, edited by Auciello, O. and Waser, R. (NATO ASI Series 284, 1994) 399 Google Scholar
4. Haertling, G.H., J. Vac. Sci. Technol. A 9 (1991) 414 Google Scholar
5. Newnham, R.E., Structure Property Relationships in Electroceramics (Pennsylvannia, 1989)Google Scholar
6. Karl, H., Stritzker, B., Mat. Res. Soc. Symp. Proc. 285 (1993) 269 Google Scholar
7. Schey, B., Biegel, W., Kuhn, M., Klarmann, R., Stritzker, B., Appl. Surf. Sci. 127–129 (1998) 540 Google Scholar
8. Desu, S.B., Phys. Stat. Sol. (a) 151 (1995) 467 Google Scholar
9. Desu, S.B., Yoo, I.K., Integrated Ferroelectrics 3 (1993) 365 Google Scholar
10. Jonker, G.H., J. Amer. Ceram. Soc. 55 (1972) 57 Google Scholar
11. Ziegler, J.F., Biersack, J.O., Littmark, U., The Stopping and Range of Ions in Solids (Pergamon Press, New York, 1995)Google Scholar
12. Zheng, L.R., Yang, P.X., Wang, L.W., Lin, C.L., Zou, S.C., NIM B 127 (1997) 621 Google Scholar
13. Tagantsev, A.K., Glazounov, A.E., Phase Transitions 65 (1998) 117 Google Scholar