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Development of PLZT Film-on-Foil Capacitors with High Dielectric Strength

Published online by Cambridge University Press:  31 January 2011

Beihai Ma ,
Manoj Narayanan  and
U. Balachandran
Beihai Ma
Affiliation:
bma@anl.gov, Argonne National Laboratory, Argonne, Illinois, United States
Manoj Narayanan
Affiliation:
mnarayanan@anl.gov, Argonne National Laboratory, Argonne, Illinois, United States
U. Balachandran
Affiliation:
balu@anl.gov, Argonne National Laboratory, Argonne, Illinois, United States
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Abstract

Ferroelectric film-on-foil capacitors hold special promise to replace discrete passive components in the development of electronic devices that require greater performance and smaller size. We have grown ferroelectric Pb0.92La0.08Zr0.52Ti0.48O3 (PLZT) films on nickel substrates by chemical solution deposition. The dielectric properties were determined for samples of ≈1.15-μm-thick PLZT film grown on LaNiO3-buffered nickel substrates. Measurements on these samples yielded a dielectric constant of ≈1300, dielectric loss (tan δ) of ≈0.05, and leakage current density of ≈7 × 10-9 A/cm2. An energy density of ≈74 J/cm3 was measured at room temperature with 250-μm-diameter capacitors. Highly accelerated lifetime tests were conducted at 100°C to determine the reliability of the ≈1.15-μm-thick film-on-foil capacitors under field stress conditions (with applied electric field from 8.7 × 105 V/cm to 1.3 × 106 V/cm). The breakdown behavior of the PLZT film-on-foil capacitors was evaluated by Weibull analysis. A voltage acceleration factor of ≈-6.3 was obtained. From the test results, a mean time to failure of >3000 hr was projected for capacitors operated at 100°C with ≈2.6 × 105 V/cm dc electric field.

Keywords

dielectric propertiesferroelectricsolution deposition
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1199: Symposium F –Multiferroic and Ferroelectric Materials , 2009 , 1199-F03-01
Copyright
Copyright © Materials Research Society 2010

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