Hostname: page-component-78c5997874-t5tsf Total loading time: 0 Render date: 2024-11-10T06:00:07.106Z Has data issue: false hasContentIssue false
  • English
  • Français

A Dual-RF-Plasma Approach for Controlling the Graphitic Order and Diameters of Vertically-Aligned Multiwall Carbon Nanotubes

Published online by Cambridge University Press:  01 February 2011

Jitendra Menda ,
Lakshman Kumar Vanga ,
Benjamin Ulmen ,
Yoke Khin Yap ,
Zhengwei Pan ,
Ilia N. Ivanov ,
Alex A. Puretzky  and
David B. Geohegan
Jitendra Menda
Affiliation:
Department of Physics, Michigan Technological University, Houghton, MI 49931, USA.
Lakshman Kumar Vanga
Affiliation:
Department of Physics, Michigan Technological University, Houghton, MI 49931, USA.
Benjamin Ulmen
Affiliation:
Department of Physics, Michigan Technological University, Houghton, MI 49931, USA.
Yoke Khin Yap*
Affiliation:
Department of Physics, Michigan Technological University, Houghton, MI 49931, USA.
Zhengwei Pan
Affiliation:
Department of Materials Science and Engineering, University of Tennessee
Ilia N. Ivanov
Affiliation:
Department of Materials Science and Engineering, University of Tennessee
Alex A. Puretzky
Affiliation:
Department of Materials Science and Engineering, University of Tennessee
David B. Geohegan
Affiliation:
Condensed Matter Sciences Division, Oak Ridge National Laboratory
*
* Email: ykyap@mtu.edu
Get access

Abstract

Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 858: Symposium HH – Functional Carbon Nanotubes , 2004 , HH3.11
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1]. Ren, Z. F., Huang, Z. P., Xu, J. W., Wang, J. H., Bush, P., Siegal, M. P., and Provencio, P. N., Science 282 (1998) 1105.Google Scholar
[2]. Merkulov, V. I., Lowndes, D. H., Wei, Y. Y., Gres, G., and Voelkl, E., Appl. Phys. Lett 76 (2000) 3555.Google Scholar
[3]. Murakami, H., Hirakawa, M, Tanaka, C., and Yamakawa, H., Appl. Phys. Lett. 76 (2000) 1776.Google Scholar
[4]. Chhowalla, M., Teo, K. B. K., Ducati, C., Rupesinghe, N. L., Amaratunga, G. A. J., Ferrari, A., Roy, D., Robertson, J., and Milne, W. I., J. Appl. Phys. 90 (2002) 5308.Google Scholar
[5]. Hirao, T., Ito, K., Furuta, H., Yap, Y. K., Ikuno, T., Honda, S., Mori, Y., Sasaki, T., Oura, K., Jpn. J. Appl. Phys. 40 (2001) L631.Google Scholar