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Effect of Precursor Sol Ageing on Sol-Gel Derived Ruthenium Oxide Thin Films

Published online by Cambridge University Press:  10 February 2011

S. Bhaskar
Affiliation:
Department of Physics, University of Puerto Rico, San Juan, PR-00931-3343USA
S. B. Majumder
Affiliation:
Department of Physics, University of Puerto Rico, San Juan, PR-00931-3343USA
P. S. Dobal
Affiliation:
Department of Physics, University of Puerto Rico, San Juan, PR-00931-3343USA
R. S. Katiyar
Affiliation:
Department of Physics, University of Puerto Rico, San Juan, PR-00931-3343USA
A. L. M. Cruz
Affiliation:
Department of Chemistry, University of Puerto Rico, san Juan, PR-00931USA
E. R. Fachini
Affiliation:
Department of Chemistry, University of Puerto Rico, san Juan, PR-00931USA
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Abstract

In the present work we have optimized the process parameters to yield homogeneous, smooth ruthenium oxide (RuO2) thin films on silicon substrates by a solution deposition technique using RuCl3.×.H2O as the precursor material. Films were annealed in a temperature range of 300°C to 700°C, and it was found that RuO2 crystallizes at a temperature as low as 400°C. The crystallinity of the films improves with increased annealing temperature and the resistivity decreases from 4.86µΩ-m (films annealed at 400°C) to 2.94pµΩ (films annealed at 700°C). Ageing of the precursor solution has a pronounced effect on the measured resistivities of RuO2 thin films. It was found that the measured room temperature resistivities increases from 2.94µΩ-m to 45.7µΩ-m when the precursor sol is aged for aged 60 days. AFM analysis on the aged films shows that the grain size and the surface roughness of the annealed films increase with the ageing of the precursor solution. From XPS analysis we have detected the presence of non-transformed RuCl3 in case of films prepared from aged solution. We propose, that solution ageing inhibits the transformation of RuCl3 to RuO2 during the annealing of the films. The deterioration of the conductivity with solution ageing is thought to be related with the chloride contamination in the annealed films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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