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Epitaxial Growth of SrTiO3 Thin Films on TiN/Si Substrates Using RF Sputtering

Published online by Cambridge University Press:  26 February 2011

Chun Wang  and
Mark H Kryder
Chun Wang
Affiliation:
chunw@andrew.cmu.edu, Carnegie Mellon University, Department of Electrical and Computer Engineering, REH 346B, 5000 Forbes ave., pittsburgh, PA, 15213, United States
Mark H Kryder
Affiliation:
kryder@ece.cmu.edu, Carnegie Mellon University, Department of Electrical and Computer Engineering, Pittsburgh, PA, 15213, United States
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Abstract

Epitaxial SrTiO3 (001) thin films with a TiN template layer have been deposited on Si(001) single crystal substrates by RF sputtering. The deposited SrTiO3 films show a surface with roughness of 0.66nm. The orientation relationship was determined to be SrTiO3(001)[110]∥TiN(001)[110]∥Si(001)[110]. The microstructure and interface of the multilayer was studied using high resolution transmission electron microscopy (TEM). The electron diffraction pattern confirmed the epitaxial relationship between each layer.

Keywords

epitaxyoxidesputtering
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 966: Symposium T – Ferroelectrics and Multiferroics , 2006 , 0966-T07-21
Copyright
Copyright © Materials Research Society 2007

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References

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