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Formation of Porous Organosilicate Glasses Produced by PECVD and UV Treatment

Published online by Cambridge University Press:  01 February 2011

Mark L. O'Neill ,
Lin-Shu Du ,
Paula L. McDaniel ,
Brian K. Peterson ,
Scott J. Weigel ,
Mary K. Haas ,
Raymond N. Vrtis ,
Dino Sinatore ,
Mark D. Bitner  and
Kathleen E. Theodorou
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Mark L. O'Neill
Affiliation:
oneillml@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States, 610-481-5096, 610-481-5361
Lin-Shu Du
Affiliation:
DUL1@airproducts.com, Air Products and Chemicals, Inc., Global Analytical Sciences, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Paula L. McDaniel
Affiliation:
MCDANIPL@airproducts.com, Air Products and Chemicals, Inc., Global Analytical Sciences, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Brian K. Peterson
Affiliation:
PETERSBK@airproducts.com, Air Products and Chemicals, Inc., Computational Modeling Center, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Scott J. Weigel
Affiliation:
WEIGELSJ@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Mary K. Haas
Affiliation:
HAASMK@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Raymond N. Vrtis
Affiliation:
VRTISRN@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Dino Sinatore
Affiliation:
SINATOD@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Mark D. Bitner
Affiliation:
BITNERMD@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Kathleen E. Theodorou
Affiliation:
THEODOKE@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
Mark L. O'Neill
Affiliation:
oneillml@airproducts.com, Air Products and Chemicals, Inc., Electronics Technology, 7201 Hamilton Blvd., Allentown, PA, 18195, United States
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Abstract

The deposition and post-treatment processes involved in the production of porous organosilicate glasses (OSGs) by plasma-enhanced chemical vapor deposition (PECVD) with ultraviolet light (UV) treatment are investigated through the use of a deuterated organic porogen precursor using infrared spectroscopy and solid-state nuclear magnetic resonance spectroscopy. Infrared analysis provides evidence for hydrogen-deuterium scrambling between the chemical species during the deposition process, which is exacerbated by the UV treatment process. Analysis of 13C cross-polarized magic angle spinning (CP-MAS) NMR suggests that the porogen exists in domains relatively isolated from the network, in agreement with short UV treatment time morphological data that indicates the pore size is relatively constant from the early stages of UV treatment process. The chemical and morphological information provides further support for a deposition controlled morphology and has implications towards enhanced chemical processing of porous organosilicate glass (OSG) films for back-end-of-line integrated circuit manufacturing.

Keywords

plasma-enhanced CVD (PECVD) (deposition)dielectricfilm
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 990: Symposium B – Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics , 2007 , 0990-B01-04
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

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