Hostname: page-component-78c5997874-t5tsf Total loading time: 0 Render date: 2024-11-14T16:50:22.795Z Has data issue: false hasContentIssue false

InGaN/GaN/AiGaN-Based Laser Diodes with an Estimated Lifetime of Longer than 10,000 Hours

Published online by Cambridge University Press:  10 February 2011

Shuji Nakamura*
Affiliation:
Department of Research and Development, Nichia Chemical Industries, Ltd., 491 Oka, Kaminaka, Anan, Tokushima 774, Japan, shuji@nichia.co.jp
Get access

Abstract

InGaN multi-quantum-well (MQW) structure laser diodes with A10.14Ga0.86N/GaN modulation doped strained-layer superlattice cladding layers grown on an epitaxially laterally overgrown GaN substrate were demonstrated to have an estimated lifetime of more than 10,000 hours under continuous-wave operation at 20°C. Under operation at a high temperature of 50°C, the lifetime was longer than 1,000 hours. The activation energy of the lifetime was estimated to be 0.5 eV. With the operating current increasing above the threshold, a self-pulsation with a high frequency of 3.5 GHz was observed. The relative intensity noise (RIN) less than -145 dB/Hz was obtained even at the 6% optical feedback using the high-frequency modulation of 600 MHz. The threshold carrier density of the InGaN MQW-structure LDs was estimated to be 3 × 1019/cm3 using a carrier lifetime of 1.8 ns.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. For a review, see Nakamura, S. and Fasol, G., The Blue Laser Diode, 1 st ed. (Springer- Verlag, Berlin, 1997).10.1007/978-3-662-03462-0Google Scholar
2. Itaya, K., Onomura, M., Nishino, J., Sugiura, L., Saito, S., Suzuki, M., Rennie, J., Nunoue, S., Yamamoto, M., Fujimoto, H., Kokubun, Y., Ohba, Y., Hatakoshi, G., and Ishikawa, M., Jpn. J. Appl. Phys. 35, L1315 (1996).10.1143/JJAP.35.L1315Google Scholar
3. Bulman, G. E., Doverspike, K., Sheppard, S. T., Weeks, T. W., Kong, H. S., Dieringer, H. M., Edmond, J. A., Brown, J. D., Swindell, J. T. and Schetzena, J. F., Electron. Lett. 33, 1556 (1997).10.1049/el:19971025Google Scholar
4. Mack, M. P., Abare, A., Aizcorbe, M., Kozodoy, P., Keller, S., Mishra, U. K., Coldren, L. and DenBaars, S., MRS Internet J. Nitride Semicond. Res. 2, 41 (1997). (Available from http://nsr.mij.mrs.org/2/5/)Google Scholar
5. Kuramata, A., Domen, K., Soejima, R., Horino, K., Kubota, S. and Tanahashi, T., Jpn J. Appl. Phys. 36, L1330 (1997).10.1143/JJAP.36.L1130Google Scholar
6. Nakamura, F., Kobayashi, T., Asatsuma, T., Funato, K., Yanashima, K., Hashimoto, S., Naganuma, K., Tomioka, S., Miyajima, T., Morita, E., Kawai, H. and Ikeda, M., ICNS'97, Tokushima, Japan, LN-8, October 2731, 1997.Google Scholar
7. Nakamura, S., Senoh, M., Nagahama, S., Iwasa, N., Yamada, T., Matsushita, T., Sugimoto, Y. and Kiyoku, H., Jpn. J. Appl. Phys. Lett. 36, L1059 (1997).Google Scholar
8. Nakamura, S., Senoh, M., Nagahama, S., Iwasa, N., Yamada, T., Matsushita, T., Kiyoku, H., Sugimoto, Y., Kozaki, T., Umemoto, H., Sano, M. and Chocho, K., ICNS'97, Tokushima, Japan, S-1, October 2731, 1997.Google Scholar
9. Matthews, J. W. and Blakeslee, A. E., J. Cryst. Growth 27, 118 (1974).Google Scholar
10. Usui, A., Sunakawa, H., Sakai, A. and Yamaguchi, A., Jpn. J. Apply. Phys. 36, L899 (1997).10.1143/JJAP.36.L899Google Scholar
11. Zheleva, T. S., Nam, O. H., Bremser, M. D. and Davis, R. F., Appl. Phys. Lett. 71, 2472 (1997).10.1063/1.120091Google Scholar
12. Kato, Y., Kitamura, S., Hiramatsu, K. and Sawaki, N., J. Cryst. Growth, 144, 133 (1994).10.1016/0022-0248(94)90448-0Google Scholar
13. Lester, S. D., Ponce, F. A., Craford, M. G. and Steigerwald, D. A., Appl. Phys. Lett. 66, 1249 (1995).10.1063/1.113252Google Scholar
14. Chichibu, S., Azuhata, T., Sota, T. and Nakamura, S., Appl. Phys. Lett. 69, 4188 (1996).10.1063/1.116981Google Scholar
15. Yamashita, S., Ohishi, A., Kajimura, T., Inoue, M. and Fukui, Y., IEEE J. Quantum Electron. QE-25, 1483 (1989).Google Scholar
16. Takayama, T., Imafuji, O., Sugiura, H., Yuri, M., Naito, H., Kume, M., Yoshikawa, A. and Itoh, K., Appl. Phys. Lett. 65, 1211 (1994).10.1063/1.112073Google Scholar
17. Suzuki, M. and Uenoyama, T., Jpn. J. Appl. Phys. 35, 1420 (1996).Google Scholar
18. Suzuki, M. and Uenoyama, T., Appl. Phys. Lett. 69, 3378 (1996).10.1063/1.117265Google Scholar
19. Chow, W. W., Wright, A. F., and Nelson, J. S., Appl. Phys. Lett. 68, 296 (1996).Google Scholar