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Published online by Cambridge University Press: 06 September 2011
A large-area graphene layer identification technique was developed for research and industrial applications. It is based on the analysis of optical microscopy images using computational image processing algorithms. The initial calibration is performed with the micro-Raman spectroscopy. The method can be applied to the wafer-scale graphene samples. The technique has the potential to be the gateway in the development of fully automated statistical process control methods for the next generation thin-film materials used by the semiconductor industry. The proposed technique can be applied to graphene on arbitrary substrates and used for other atomically thin materials.