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Macroscopic Magnetic Measurements on Microscopic Quantities of Materials

Published online by Cambridge University Press:  10 February 2011

Simon Foner
Simon Foner*
Affiliation:
Francis Bitter Magnet Laboratory, MIT, Cambridge, MA 02139, sfoner@slipknot.mit.edu
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Abstract

The principles of several of the most popular macroscopic magnetic measurement techniques are discussed for the vibrating sample magnetometer, SQUID magnetometer, ac susceptometer, ac force magnetometer, and torque magnetometers. These types of instruments are available commercially as stand-alone computer-controlled systems, Selected examples of recent measurements on thin films, small particles, and clusters of magnetic ions are presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 475: Symposium M – Magnetic Ultrathin Films, Multilayers, and Surfaces – 1997 , 1997 , 3
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Foner, S., Encycl. Appl. Phys. 9, 463 (1994). This article gives an extensive review of measurements of magnetic properties.Google Scholar
2. Flanders, P.J. and Graham, C.D., Rep. Prog. Phys. 56, 431 (1993).Google Scholar
3. Foner, S., J. Appl. Phys. 79, 4740 (1996).Google Scholar
4. Zilstra, H., Experimental Methods of Magnetism, edited by Wohlfarth, E.P. (Wiley, New York, 1967), Vols. 1 and 2.Google Scholar
5. Foner, S., IEEE Trans. Magn. MAG–17, 3358 (1981).Google Scholar
6. Zeiba, A. and Foner, S., Rev. Sei. Instrum. 53, 1344 (1982).Google Scholar
7. Flanders, P.J., J. Appl. Phys. 63, 3940 (1988); see also, Rev. Sei. Instrum. 61, 839 (1990).Google Scholar
8. Chaparala, M., Chung, O.H., and Naughton, M.J., A.I.P. Conference Proc. 273, 407 (1993).Google Scholar
9. Kirtley, J.R., Ketchen, M.B., Tsuei, C.C., Sun, J.Z., Gallagher, W.J., Yu-Jahnes, Lock See, Gupta, A., Stawiasz, K.G., and Wind, S.J., IBM Jour. Res. and Dev., 39, 655 (1995).Google Scholar
10. Kirtley, J.R., IEEE Spectrum, Dec. 1996, p. 40.Google Scholar
11. Kodama, R.H., Berkowitz, A.E., McNiff, E.J. Jr, and Foner, S., Phys. Rev. Lett., 77, 394 (1996).Google Scholar
12. Shapira, Y., J. Appl. Phys. 67, 5090 (1990).Google Scholar
13. Bindilatti, V., Vu, T.Q., Shapira, Y., Agosta, C.C., McNiff, E.J. Jr, Kershaw, R., Dwight, K., and Wold, A., Phys. Rev. B45, 5328 (1992).Google Scholar
14. Taft, K.L., Delfs, C.D., Papaefthymiou, G.C., Foner, S., Gatteschi, D., and Lippard, S., J. Am. Chem. Soc. 116, 823 (1994).Google Scholar
15. Friedman, J.R., Sarachik, M.P., Tejada, T., and Ziolo, R., Phys. Rev. Lett. 76, 3830 (1996).Google Scholar