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Modified Line-of-Sight Model for Deposition of Tungsten Silicide Barrier Layers

Published online by Cambridge University Press:  25 February 2011

Timothy S. Cale  and
Gregory B. Raupp
Timothy S. Cale
Affiliation:
Department of Chemical, Bio & Materials Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, AZ 85287–6006
Gregory B. Raupp
Affiliation:
Department of Chemical, Bio & Materials Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, AZ 85287–6006
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Abstract

A modified line-of-sight model for transport and deposition during LPCVD is used to predict step coverage and film composition uniformity of tungsten silicide barrier layers. Predictions are compared with experimental results for 2 μim wide by 6 μm deep trenches with barrier layers of 0.2 μm nominal thickness. Model predictions are in quantitative agreement with those of a diffusion-reaction model and are in qualitative agreement with experiment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 181: Symposium B – Advanced Metallizations in Microelectronics , 1990 , 603
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Raupp, G. B., Cale, T. S., Jain, M. K., Rogers, B. and Srinivas, D., presented at 8th Intl. Conf. Thin Films, San Diego, CA, April 1990, and submitted to Thin Solid Films.Google Scholar
2. Cale, T. S. and Raupp, G. B., submitted to J. Vac. Sci. Technol. B.Google Scholar
3. Yuuki, A., Matsui, Y. and Tachibana, K., Jap. J. Appl. Phys. 1989, 28, 212.CrossRefGoogle Scholar
4. Cale, T. S., Raupp, G. B. and Gandy, T., accepted for publication in J. Applied. Phys.Google Scholar