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Nano-scale Interfacial Reactions of SrRuO3 Thin Film on Si (100) Substrate

Published online by Cambridge University Press:  21 March 2011

Sang Ho Oh  and
Chan-Gyung Park
Sang Ho Oh
Affiliation:
Center for Advanced Aerospace Materials (CAMM), Dept. of Materials Science & Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea
Chan-Gyung Park
Affiliation:
Center for Advanced Aerospace Materials (CAMM), Dept. of Materials Science & Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea
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Abstract

Interfacial reactions between SrRuO3 films and Si substrate were investigated by using field emission-transmission electron microscopy (FE-TEM). The compositional and structural variations across the interface were analyzed by using energy dispersive X-ray spectroscopy (EDS) and diffraction with an electron probe in 0.5 nm in diameter. Two constituent binary oxides of SrRuO3, i.e. SrO and RuO2, were found to react differently on Si surface: 1) SrO in stable contact with Si, and 2) RuO2 in unstable contact. The reduction of SrRuO3 to elemental Ru by Si is believed to be most favorable candidate for the reaction leading to the unstable contact of SrRuO3 on Si.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 666: Symposium F – Transport and Microstructural Phenomena , 2001 , F7.8
Copyright
Copyright © Materials Research Society 2001

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References

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