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Novel Precursors for MOCVD of Thin Films of Metal Oxides Containing Early Transition Metals

Published online by Cambridge University Press:  10 February 2011

Hywel O. Davies ,
Kirsty A. Fleeting ,
Timothy J. Leedham ,
Anthony C. Jones ,
Paul O'Brien  and
David J. Otway
Hywel O. Davies
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK
Kirsty A. Fleeting
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK
Timothy J. Leedham
Affiliation:
Inorgtech Ltd., 25 James Carter Rd, Mildenhall, Suffolk, IP28 7DE, UK
Anthony C. Jones
Affiliation:
Inorgtech Ltd., 25 James Carter Rd, Mildenhall, Suffolk, IP28 7DE, UK Email: tony@tjconsultancy.demon.co.uk
Paul O'Brien
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, Londonx, SW7 2AZ, UK Email: p.obrien@ic.ac.uk
David J. Otway
Affiliation:
Department of Chemistry, Imperial College of Science, Technology and Medicine, Exhibition Road, London, SW7 2AZ, UK Email: d.j.otway@ic.ac.uk
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Abstract

MOCVD is a useful method for the deposition of thin films of metal oxides containing early transition metals, e.g., lead zirconium titanate, (PZT), because of its good step coverage and control of composition. Results are presented on a number of novel compounds which may be, or are, good MOCVD precursors. The compounds studied are in several general classes and include M(←diket)x, M(OR)x, M(←diket)x (OR)y [where M = Ti, Zr, Hf, Ta; ←-diket = tmhd (2,2,6,6-tetramethylheptane-3,5-dione), acac (acetylacetonate), hfac (1,1,1,5,5,5-hexafluoroacetylacetonate); R = Me, Et, Pr1, Butt]. We have sought to modify the precursors through chemical methods and have synthesized a number of novel, volatile, and intrinsically thermally stable MOCVD precursors. Full chemical characterization of the precursors (NMR, IR, MS, CHN, TGA/DSC, Single Crystal X-ray diffraction) has been undertaken.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 541: Symposium O – Ferroelectric Thin Films VII , 1998 , 333
Copyright
Copyright © Materials Research Society 1999

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References

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