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Physical origin of colossal dielectric constant in CaCu3Ti4O12 thin film by Pulsed Laser Deposition

Published online by Cambridge University Press:  01 February 2011

Guochu Deng ,
Tomoaki Yamada  and
Paul Muralt
Guochu Deng
Affiliation:
guochu.deng@epfl.ch, Ecole Polytechnique Fédérale de Lausanne, Ceramics Laboratory, EPFL-STI-IMX-LC, Station 12, Lausanne, CH1015, Switzerland, 0041-021-693 58 69, 0041-021-693 58 10
Tomoaki Yamada
Affiliation:
Tomoaki.Yamada@epfl.ch, Ecole Polytechnique Federale de Lausanne, Ceramics Laboratory, Station 12, Lausanne, CH1015, Switzerland
Paul Muralt
Affiliation:
paul.muralt@epfl.ch, Ecole Polytechnique Federale de Lausanne, Ceramics Laboratory, Station 12, Lausanne, CH1015, Switzerland
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Abstract

The (001) preferentially oriented CCTO thin film was grown on Pt/Ti/TiO2/Si (100) substrate by pulsed laser. I-V and C-V relationships of the CCTO thin film showed characteristics typical of a tunnel metal-insulator-semiconductor (MIS) structure and its capacitance response is the origin of the high apparent dielectric constant observed in CCTO thin films. The very thin insulating layer on top of the film can be reduced in thickness by treatment in HCl acid, as shown by smaller threshold voltages in the I-V curves. The overall behavior is compatible with a conduction activation energy of ∼80 to 100 meV in the bulk of the film, and a diffusion potential at the interface of 500 to 800 meV. The acceptor concentration is of the order of 1019cm−3.

Keywords

dielectric propertieslaser ablationsemiconducting
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1073: Symposium H – Materials Science of High-k Dielectric Stacks—From Fundamentals to Technology , 2008 , 1073-H05-04
Copyright
Copyright © Materials Research Society 2008

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References

REFERENCES

1. Subramanian, M. A. Li, D. Duan, N. Reisner, B. A. and Sleight, A. W. J. Solid State Chem. 151, 323–325 (2000).Google Scholar
2. Ramireza, A. P. Subramanian, M. A. Gardela, M. Blumberga, G. Lib, D. Vogtc, T. and Shapiroc, S. M. Solid State Commun. 115, 217–220 (2000).Google Scholar
3. Sinclair, D. C. Adams, T. B. Morrison, F. D. and West, A. R. Appl. Phys. Lett. 80, 2153–2155 (2002).Google Scholar
4. Lunkenheimer, P. Bobnar, V. Pronin, A. V. Ritus, A. I. Volkov, A. A. and Loidl, A. Phys. Rev. B 66, 052105 (2002).Google Scholar
5. Lunkenheimer, P. Fichtl, R. Ebbinghaus, S. G. and Loidl, A. Phys. Rev. B 70, 172102 (2004).Google Scholar
6. Chung, S.-Y. Kim, I.-D., and Kang, S.-J. L. Nature Mater. 3, 774 (2004).Google Scholar
7. He, L. Neaton, J. B. Cohen, M. H. and Vanderbilt, D. Phys. Rev. B 65, 214112 (2002).Google Scholar
8. Krohns, S. Lunkenheimer, P. Ebbinghaus, S. G. and Loidl, A. Appl. Phys. Lett. In press (2006).Google Scholar
9. Homes, C. C. Vogt, T. Shapiro, S. M. Wakimoto, S. and Ramirez, A. P. Science 293, 673 (2001).Google Scholar
10. Si, W. Cruz, E. M. Johnson, P. D. Barnes, P. W. Woodward, P. and Ramirez, A. P. Appl. Phys. Lett. 81, 2056–2058 (2002).Google Scholar
11. Lin, Y. Chen, Y. B. Garret, T. Liu, S. W. Chen, C. L. Chen, L. Bontchev, R. P. Jacobson, A. Jiang, J. C. Meletis, E. I. Horwitz, J. and Wu, H.-D., Appl. Phys. Lett. 81, 631–633 (2002).Google Scholar
12. Maeder, T. Sagalowicz, L. and Muralt, P. Jpn. J. Appl. Phys. 37, 2007–2012 (1998).Google Scholar
13. Sarkar, S. Jana, P. K. and Chaudhuri, B. K. Appl. Phys. Lett. 89, 212905 (2006).Google Scholar
14. Adams, T. B. Sinclair, D. C. and West, A. R. J. Am. Ceram. Soc. 89, 2833.2838 (2006).Google Scholar
15. Card, H. C. and Rhoderick, E. H. J. Phys. D: Appl. Phys. 4, 1589–1601 (1971).Google Scholar
16. Card, H. C. and Rhoderick, E. H. J. Phys. D: Appl. Phys. 4, 1602–1611 (1971).Google Scholar
17. Cowley, A. M. J. Appl. Phys. 37 (1966).Google Scholar
18. Adams, T. B. Sinclair, D. C. and West, A. R. Phys. Rev. B 73, 094124 (2006).Google Scholar