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Published online by Cambridge University Press: 26 February 2011
The electrical properties and preferred lattice sites of Cu in GaAs were studied combining electrical and optical measurements with Particle Induced X-ray Emission (PIXE) and Channeling. For electronic characterization, Deep Level Transient Spectroscopy (DLTS), Hall Effect measurements, and Photoluminescence (PL) were used. From this comprehensive study it was determined that Cu introduces two levels in the bandgap, that the concentration of electrically active copper is considerably smaller than the total copper concentration, and that most of the Cu in GaAs is not of purely substitutional character.