Hostname: page-component-78c5997874-fbnjt Total loading time: 0 Render date: 2024-11-13T04:50:46.332Z Has data issue: false hasContentIssue false

Pulsed Laser Deposition in a Zinc Alloy Corrosion Study

Published online by Cambridge University Press:  15 February 2011

R. Guerrero-Penalva
Affiliation:
Instituto Tecnológico de Tijuana, Centro de Graduados e Investigación, Apartado Postal 1166, Tijuana, BC 22000, México.penalva@telnor.net
M.H. Farías
Affiliation:
Centro de Ciencias de la Materia Condensada de la UNAM, Apartado Postal 2681, Ensenada, BC 22800, México.mario@ccmc.unam.mx, leonel@ccmc.unam.mx, Fax +++52-6-1744603
L. Cota-Araiza
Affiliation:
Centro de Ciencias de la Materia Condensada de la UNAM, Apartado Postal 2681, Ensenada, BC 22800, México.mario@ccmc.unam.mx, leonel@ccmc.unam.mx, Fax +++52-6-1744603
Get access

Abstract

A significant improvement in corrosion resistance of the protecting oxide of alloys has been observed when adding small amounts of reactive elements, such as yttrium, this effect has been called reactive element effect (REE). The general mechanism of the REE has not been determined yet. In this work, we study a growing of a yttrium oxide film and its interaction with the phases η and α that constitutes the alloy Zn-22Al-2Cu named ZinalcoTM The alloy's surface was coated by a pulsed laser deposition technique. The deposit is controlled and characterized by x-ray photoelectron spectroscopy. The mechanism by which the reactive element produce its effects in this alloy is explained by the preferential interaction among the active sites related to the zinc rich phase and enhancing aluminum movement toward the surface where it is oxidized and the protection film formed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

references

1. Pfeil, L.B., Br. Patent 574088 (1945).Google Scholar
2. Pint, B., Oxid. Metal., 45 (1) (1996).Google Scholar
3. Rudd, Amy. L, Breslin, Carmel, Mansfeld, F., Corr. Sci., 42, 275 (2000)Google Scholar
4. Stringer, J., Mat. Sci. Eng., A, 120, 129 (1989)Google Scholar
5. Bennett, M., Bishop, H., Chalker, P. and Tuson, A., Mater. Sci. and Eng., 90, 177 (1987)Google Scholar
6. Wang, K.L., Zhang, Q.B., Sun, M.L., Wei, X.G., Zhu, Y.M., 255. Corr. Sci.,, 43, 255 (2001)Google Scholar
7. Hou, P.Y. and Stringer, J., J. Electrochem. Soc., 134, 1836 (1987)Google Scholar
8. Nelson, R., Ramsay, J., Woddhead, J., Cairns, J., Crossley, J., Thin Solid Films, 81, 329 (1981)Google Scholar
9. Hussey, R.J. and Graham, M.J., Oxid. Metal., 45, 349 (1996)Google Scholar
10. Lu, X.Y., He, Y.D. and Zhu, R.Z., China patent, 93 1001181.1 (1993).Google Scholar
11. Guerrero, R., Farias, M.H. and Cota, L.; App. Surf. Sci., 185 (3-4), 248 (2002).Google Scholar
12. JM, Hill et al., Chem. Phys. Lett. 44, 225 (1976)Google Scholar
13. Torres-Villaseñor, G., Ugalde, A., Hernandez, L., Singer, J. L., Corr. Sci., 24, (3) 159 (1984).Google Scholar
14. Guerrero, R., Farias, M.H., Cota, L.. App. Surf. Sci., 195 (1-4) 137 (2002).Google Scholar
15. Luth, H., Surfaces and Interfaces of solid Materials, Third edition, Springer-Verlag. (1995).Google Scholar
16. Tsaneva, V., et al., Vacuum, 48, (10) 803 (1997).Google Scholar
17. Singh, K. R. and Narayan, J., Phys. Rev. B, Vol 41, No. 13, 1990.Google Scholar
18. Cubicciotti, D., J. Phys. Chem., 71, 3066 (1967)Google Scholar
19. Siegel, B., Q. Rev. (London), 19, 77 (1965)Google Scholar
20. Kondratiev, V. N., Bond Dissociation Energies, Ionization Potentials and Electron Affinities, Mauka Publishing House, Moscow, (1974).Google Scholar
21. Wagman, D. Wag -, et al., J. Phys. Chem. Ref. Data, Suppl. No. 2 (1982).Google Scholar
22. Kub-Kubaschewski, O., Materials Thermochemistry 6 ed., Oxford Pergamon Press (1993).Google Scholar
23. Clemmer, D. E., Daltaska, N. F., and Armentrout, P. B., J. Chem. Phys., 95, 7263, (1991).Google Scholar
24. Ishwar, N. B.,Varma, M. P., and Jha, B. L., Indian J. Pure Appl. Phys., 20, 992 (1982)Google Scholar
25. Clemmer, D. E., Weber, M. E., and Armentrout, P. B., J. Phys.Google Scholar