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Roughness Characterization by Optical Spectroscopy of CoSi2 Thin Films

Published online by Cambridge University Press:  15 February 2011

S. Bocelli ,
G. Guizzetti ,
F. Marabelli ,
S. Hatziconstantinidou  and
C.S. Petersson
S. Bocelli
Affiliation:
INFM – Dipartimento di Fisica “A.Volta”, Università di Pavia, I-27100 PAVIA, Italy
G. Guizzetti
Affiliation:
INFM – Dipartimento di Fisica “A.Volta”, Università di Pavia, I-27100 PAVIA, Italy
F. Marabelli
Affiliation:
INFM – Dipartimento di Fisica “A.Volta”, Università di Pavia, I-27100 PAVIA, Italy
S. Hatziconstantinidou
Affiliation:
Royal Institute of Technology, Solid State Electronics – BOX 229, S-16440 KISTA – STOCKHOLM, Sweden.
C.S. Petersson
Affiliation:
Royal Institute of Technology, Solid State Electronics – BOX 229, S-16440 KISTA – STOCKHOLM, Sweden.
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Abstract

Specular and diffuse reflectance and spectroscopic ellipsometry were used to characterize a series of Cosi2 films obtained by heat treatment on a Co/Ti bilayer. The surface quality is strongly affected by etching procedures. The intrinsic optical properties of the CoSi2 film exhibit a small dependence on the growth technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 440: Symposia CA – Structure and Evolution of Surfaces , 1996 , 341
Copyright
Copyright © Materials Research Society 1997

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