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Single Asperity Chemical Mechanical Wear Studied by Atomic Force Microscopy

Published online by Cambridge University Press:  01 February 2011

Forrest Stevens ,
Steve Langford  and
J. Thomas Dickinson
Forrest Stevens
Affiliation:
Physics Department, Washington State UniversityPullman, WA 99164-2814
Steve Langford
Affiliation:
Physics Department, Washington State UniversityPullman, WA 99164-2814
J. Thomas Dickinson
Affiliation:
Physics Department, Washington State UniversityPullman, WA 99164-2814
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Abstract

Nanometer scale wear caused by a single asperity of silicon nitride was examined by measuring the wear caused by atomic force microscope tips translated against sodium trisilicate glass, soda-lime glass, or fused silica in aqueous solutions. As a function of contact force, FN, and scan duration, t, the wear to both tip and substrate scales approximately as (FNt)0.5. Substrate wear was independent of temperature from 5°C to 60°C, whereas tip wear showed a temperature dependence on soda-lime glass corresponding to an activation energy of 60 kJ/mol on soda-lime glass.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 767: Symposium F – Chemical-Mechanical Planarization , 2003 , F2.1
Copyright
Copyright © Materials Research Society 2003

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References

1. Moon, Won-chul, Contera, Sonia Antoranz, Yohsinobu, Tatsuo, and Iwasaki, Hiroshi, “Nanotribology of Clean and Oxide-Covered Silicon Surfaces Using Atomic Force Microscopy,” Jpn. J. Appl. Phys. 39, 272–274 (2000).Google Scholar
2. Katsuki, Futoshi, Kamei, Kazuhito, Saguchi, Akihiko, Takahashi, Wataru, and Watanabe, Junji, “AFM Studies on the Difference in Wear Behaviour Between Si and SiO2 in KOH Solution,” J. Electrochem. Soc. 147 (6), 2328–2331 (2000).Google Scholar
3. Maw, W., Stevens, F., Langford, S. C., and Dickinson, J. T., “Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy,” J. Appl. Phys. 92 (2), 5103–5109 (2002).Google Scholar
4. Chen, Ming, Kato, Koji, and Adachi, Koshi, “Friction and wear of self-mated SiC and Si3N4 sliding in water,” Wear 250, 246–255 (2001).Google Scholar
5. Jahanmir, S. and Fischer, T. E., “Friction and wear of silicon nitride lubricated by humid air, water, hexadecane and hexadecane + 0.5 percent stearic acid,” STLE Transactions 31 (1), 32–43 (1988).Google Scholar
6. Muratov, V. A., Luangvaranunt, T., and Fischer, T. E., “The Tribochemisty of Silicon Nitride: Effects of Friction, Temperature and Sliding Velocity,” Tribology International 31 (10), 601–611 (1998).Google Scholar