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Spin Coating Planarization Of Integrated Circuit Topography On A Rotating Disk

Published online by Cambridge University Press:  15 February 2011

Roger K. Yonkoski  and
David S. Soane
Roger K. Yonkoski
Affiliation:
Department of Chemical Engineering, University of California Berkeley, Berkeley CA 94720.
David S. Soane
Affiliation:
Department of Chemical Engineering, University of California Berkeley, Berkeley CA 94720.
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Abstract

Polyimide is commonly used in the microelectronic industry for interconnection applications because of its ability to planarize features typically found on an IC chip. A mathematical model is developed to describe fluid flow on a rotating disk based on the principles of mass and momentum conservation. Constitutive relationships necessary for this model are proposed. Experimental data for polyimide precursor solutions are presented which enable the determination of parameters for the constitutive equations. This model is used to describe the film profiles over flat surfaces and near micron-sized features. Attention is focused on the coupling between mass transport and fluid flow as well as the effects of surface tension on film profiles over topographical features.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 227: Symposium J – Materials Science of High Temperature Polymers for Microelectronics , 1991 , 259
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1. Bornside, D.E., Macosko, C.W. and Scriven, L.E., J. Imagining Technol. 13 (4), 122 (1987).Google Scholar
2. Damon, G.F., Proc. Second Kodak Seminar on Microminaturation, Rochester NY, p. 36 (1967).Google Scholar
3. Lai, J.H., Poly. Eng. Sci. 19,1117 (1979).CrossRefGoogle Scholar
4. Chen, B.T., Polm. Eng. Sci. 23 (7), 399 (1983).CrossRefGoogle Scholar
5. O'Hagan, P. and Daughton, W.J., Proc, Kodak Seminar on Microelectronics. Rochester NY, p. 95 (1977).Google Scholar
6. Givens, F.L. and Daughton, W.J., J. Electrochem. Soc. 126 (2), 269 (1979).CrossRefGoogle Scholar
7. Daughton, W.J. and Givens, F.L., J. Electrochem. Soc. 129 (1), 173 (1982).CrossRefGoogle Scholar
8. Emslie, A.G., Bonner, F.T. and Peck, L.G., J. Appl. Phys. 29 (5), 858 (1958).CrossRefGoogle Scholar
9. Sukanek, P.C., J. Imaging Technol. 11 (4), 184 (1985).Google Scholar
10. Sukanek, P.C., J. Electrochem. Soc. 136 (10), 3019 (1989).CrossRefGoogle Scholar
11. Washo, B.D., IBM J. Res. Dev. 21. 190 (1977).CrossRefGoogle Scholar
12. Ohara, T., Matsumoto, Y. and Ohashi, H., Phys. Fluids A 1 (12), 1949 (1989).CrossRefGoogle Scholar
13. Meyerhofer, D., J. Appl. Phys. 42 (7), 3993 (1978).CrossRefGoogle Scholar
14. Flack, W.W., Soong, D.S., Bell, A.T. and Hess, D.W., J. Appl. Phys. 56 (4), 1199 (1984).CrossRefGoogle Scholar
15. Bornside, D.E., Macosko, C.W. and Scriven, L.E., J. Appl Phys. 66 (11), 5185 (1989).CrossRefGoogle Scholar
16. Jenekhe, S.A., Ind. Eng. Chem. Fundam. 23. 425 (1984).CrossRefGoogle Scholar
17. Shimoji, S., Jpn. J. Appl. Phys. 26 (6), L905 (1987).CrossRefGoogle Scholar
18. Cahn Instruments, Instrument Manual for D200 Digital Recording Balance, Cerritos, Ca,Google Scholar
19. Czanderna, A.W. and Wolsky, S.P., in Elsevier Methods and Phemomena Series (Elsevier Scientific Publishing Company, London, 1980).Google Scholar
20. McMaster, M.G., MS Thesis, University of California, Berkeley, 1988 Google Scholar
21. Rodriguez, F., Principles of Polymer Systems, (McGraw-Hill, San Francisco, 1982).Google Scholar
22. Lin, C.C. and Segal, L.A., Mathematics Applied to Deterministic Problems in the Natural Sciences, (Macmillian Publishing Co., Inc., New York, 1974).Google Scholar